1) deposition voltage
沉积电压
1.
Influence of deposition voltage on nanoporous ZnO films by electrochemical synthesis;
沉积电压对电化学合成纳米ZnO多孔薄膜的影响
2.
The influence of deposition voltage on the phase composition and microstructure of HAp coatings was investigated.
采用水热电沉积法在碳/碳复合材料表面制各了羟基磷灰石(hydroxyapatite,HAp)涂层,用X射线衍射、扫描电子显微镜,万能材料试验机等测试手段对涂层进行了表征,研究了沉积电压对HAp涂层晶相和显微结构的影响。
3.
The effect of deposition voltage on auxiliary heat PCVD-TiN coatings has been studied.
研究了不同的沉积电压对辅助加热式PCVD -TiN涂层的影响。
2) variety pressure deposition
变电压沉积
3) deposition pressure
沉积压力
1.
The effect of deposition pressure on the properties of PC film;
沉积压力对Parylene C膜性能的影响
2.
The structure and properties of the films during the course of deposition and polymerization were dominated by deposition pressure.
采用化学气相沉积法制备的聚氯代对二甲苯(PPXC)薄膜具有优异的耐溶剂腐蚀及气体阻隔性能,其沉积聚合过程中,沉积压力对膜的结构与性能具有显著影响。
3.
Effects of deposition pressure on structure and properties of thin film were investigated using XRD,SEM,UV-Vis spectrometer and FT-IR four-probe resistivity meter.
采用射频(RF)磁控溅射方法在玻璃衬底上制备了氢化纳米硅薄膜,研究了沉积压力(4~9 Pa)对薄膜结构和性能的影响。
4) deposition pressure
沉积气压
1.
To lower the surface roughness of diamond thin films by improving the CVD depositing technology, two kinds of new technical methods are proposed by appropriately increasing the carbon source concentration and controlling the deposition pressure.
为通过改进CVD沉积工艺减小金刚石薄膜表面粗糙度 ,提出了适当提高碳源浓度和合理控制沉积气压两项新的工艺方法 ,并通过切削试验研究了其对金刚石薄膜刀具耐用度及切削性能的影
2.
For the diamond films prepared at high deposition pressure,scanning electron microscope images show clearly the crystals and the Raman spectra have sharp peaks at 1332 cm-1,which shows good quality of diamond films.
研究了微波化学气相沉积中沉积气压对金刚石薄膜生长速率和质量的影响。
3.
The influence of different substrate temperature and different deposition pressure on the crystallinity of GaN films are systematically studied by X-ray Diffraction(XRD),Atomic Force Microscope(AFM).
研究表明,在750℃的沉积温度时,GaN薄膜的结晶质量较高;在20 Pa以下的沉积气压下,GaN薄膜的晶体质量随着沉积气压的升高而提高。
5) electrodeposition
电沉积
1.
Application of electrochemical impedance spectroscopy to the research of electrodeposition—Part I;
电化学阻抗谱在电沉积研究中的应用(一)
2.
New Evolution of Electrodeposition of Nanoalloys;
电沉积纳米晶合金的最新进展
3.
Effect of hydrogen evolution on the growth of nickel dendrite by electrodeposition;
析氢对电沉积镍枝晶生长的影响
6) electrochemical deposition
电沉积
1.
Study on the preparation of calcium phosphate coatings on Ti substrate by electrochemical deposition under different conditions;
电沉积钙磷盐涂层及其影响因素的研究
2.
The bio-coatings were prepared on the surface of titanium alloy(Ti-6Al-4V) by electrochemical deposition technique.
通过采用恒电流模式和脉冲电源模式考察不同的电源模式对电沉积磷酸钙涂层的影响。
3.
The surfaces of the electrodes were prepared by electrochemical deposition.
5,1,2),制备稀土(La,Nd)掺杂Sn,Sb溶胶,以钛电极为基体,用溶胶-凝胶法制备稀土(La,Nd)掺杂SnO2中间层,热处理温度为450和500℃,热处理时间共5 h;采用电沉积法制备PbO2表面层,得到改性PbO2阳极,优化了制备改性PbO2电极的稀土掺杂量。
补充资料：标准操作冲击电压波形(见冲击电压发生器)
标准操作冲击电压波形(见冲击电压发生器)
standard switching impulse voltage waveform
b .oozhun CooZuo ChongJld，onyo boxlng标准操作冲击电压波形(standard switchingimpulse voltage waveform)见冲击电压发生器。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条