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1)  Polishing Pad
抛光垫
1.
Investigation of functions and effects of polishing pad conditioning in chemical mechanical polishing;
化学机械抛光中抛光垫修整的作用及规律研究
2.
The performances of a polishing pad are determined by the type and properties of pad materials, the surface structure and state as well as the conditioning parameters.
抛光垫是化学机械抛光 (CMP)系统的重要组成部分。
3.
According to the analysis of the structure of polishing pad,polishing machine and polishing slurry,the merits of fixed abrasives (FA)CMP were presented.
经过对传统化学机械抛光技术的研究与分析,指出了目前ULSI制造中使用的传统化学机械抛光技术的缺点,通过对固结磨料化学机械抛光中的抛光垫结构、抛光机原理及抛光液的分析,得出了固结磨料化学机械抛光技术的优点,同时还对硅片固结磨料化学机械抛光的缺陷进行了研究。
2)  pad [英][pæd]  [美][pæd]
抛光垫
1.
Study on Conditioner for Polishing Pad in CMP;
化学机械抛光用抛光垫修整器的研究
2.
Study on Conditioning Technology of Polishing Pad in CMP;
化学机械抛光中抛光垫修整技术的研究
3.
Study on the Effects of the Surface Texture and Constituent of the Pad in CMP;
抛光垫表面构造和组织对CMP影响效果的研究
3)  soft pad
软抛光垫
1.
A new three-body nonlinear-micro-contact model based on the the Sneddon s equation is de- veloped for chemical-mechanical polishing(CMP)with soft pad,which is different from the Hertz contact theory.
提出一种新的化学机械抛光(CMP)中软抛光垫的三体非线性微观接触模型。
4)  polishing cloth/polishing pad
抛光布/抛光垫
5)  Fixed Abrasive Pad
固结磨料抛光垫
6)  polyurethane waxless polishing pad;waxless polishing pad
聚氨酯无蜡抛光软垫
补充资料:抛光剂,抛光混合剂
CAS:68909-13-7
中文名称:焙烧提浓的氟碳铈镧矿;抛光剂,抛光混合剂
英文名称:Bastnaesite, calcined concentrate;Calcined bastnasite;bastnaesite, calcined conc.;polishing compound;Bastnaesite,calcined concentrate
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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