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1)  electroless Ni-Co-W-P plating
化学镀Ni-Co-W-P
1.
In order to improve the deposition rate, anti - corrosion properties and high hydrogen overpotential of electroless Ni-Co-W-P plating, the effects of the composition, pH value, temperature, rotation speed and surface active agents were respectively studied on the deposition rate and corrosion resistance of electroless Ni-Co-W-P coating.
为改善化学镀Ni-Co-W-P合金工艺镀速慢、镀层耐腐蚀性能差、析氢过电位高等问题,研究了镀液组分、pH值、温度、转速、表面活性剂对45钢上化学镀Ni-Co-W-P合金镀层沉积速度、耐腐蚀性能、镀层厚度、孔蚀率、表面形貌和硬度的影响,得出最佳镀液配方:6g/LCoSO4,24g/LNiSO4,20g/LNaH2PO2,20g/LNa2WO4·2H2O,20g/L(NH4)2SO4,24g/LNa3C6H5O7,11g/L苹果酸,pH值7。
2)  electroless plating Ni-W-Mo-P
化学镀Ni-W-Mo-P
1.
Effects of Na2WO4 concentration,pH value,temperature and time on the deposition rate,hardness,porosity corrosion resistance and corrosion potential of electroless plating Ni-W-Mo-P,were studied so as to improve the deposition rate,hardness and anti-corrosion properties of electroless plating Ni-W-Mo-P respectively.
为了获得四元化学镀Ni-W-Mo-P合金的高镀速、高硬度和高耐腐蚀性,以三元化学镀Ni-Mo-P的镀液配方为基础,研究了钨酸钠浓度、pH、施镀温度、时间对Ni-W-Mo-P合金镀层沉积速度、硬度、孔隙率、耐蚀性、腐蚀电位的影响,得出最佳化学镀工艺:30~40g/L钨酸钠;pH 9;85~90℃;1。
3)  Co-Ni-P electroless plating
化学镀Co-Ni-P
4)  Ni-P/Ni-W-P double-coating
Ni-P/Ni-W-P双层化学镀
5)  Electroless Ni-W-P coating
化学镀Ni-W-P镀层
6)  Electroless Ni-W-P alloy coating
化学镀Ni-W-P合金镀层
1.
Electroless Ni-W-P alloy coating with strong corrosion resistance and high hardness has a wide range of applications and is easy to form amorphous structure.
化学镀Ni-W-P合金镀层易形成非晶态结构,具有较强的耐腐蚀性及较高的硬度,应用范围十分广泛。
补充资料:镀覆用化学品
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性质:在印制电路板生产中涉及到化学镀铜、电镀铜、电镀锡/铅、电镀金、电镀镍等许多镀覆工艺。在基板上镀覆金属镀层主要有以下作用:(1)在通孔上进行化学镀以使双面板正反面相连或使多层板各层相连;(2)电镀通孔或在板上电镀电路图形;(3)在电路上镀保护层以防其氧化并作为下道腐蚀工序的抗蚀镀层;(4)在印制板上镀覆接触键(插头座)。另外,在集成电路和电子元器件生产制造过程中也涉及许多镀覆工艺。镀覆化学品系指上述镀覆工艺使用的一系列化学镀液和化合物。化学镀液的技术性、专用性、配套性很强,同一类镀液各公司的配方不尽相同,镀液性能及其使用工艺对镀层的质量有很大影响。

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