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1)  RF magnetron sputtering
RF磁控溅射
1.
Annealing effect on mechanical properties of RF magnetron sputtering ZnO thin film;
退火温度对RF磁控溅射ZnO薄膜力学性能的影响
2.
Influence of RF magnetron sputtering processes on morphology of TiNi_(1-x)Cu_x alloy films;
RF磁控溅射工艺对TiNi_(1-x)Cu_x合金薄膜组织形貌的影响
3.
The zinc oxide (ZnO) thin films were deposited on Si(100) substrate by RF magnetron sputtering technique.
通过RF磁控溅射在Si(100)基片上制备了ZnO薄膜,并研究了磁控溅射中各生长参数,如衬底温度、氧分压及后处理工艺等因素对ZnO薄膜微结构、表面形貌与结晶取向的影响。
2)  reactive RF magnetron sputtering
反应RF磁控溅射
1.
Properties of amorphous SiO 2 films prepared by reactive RF magnetron sputtering method;
反应RF磁控溅射法制备非晶氧化硅薄膜及其特性研究
3)  magnetron sputtering
磁控溅射
1.
Preparation and characterization of anti-bacterial nonwovens by magnetron sputtering rare-earth activated TiO_2 onto PET fabric;
磁控溅射制备稀土激活TiO_2复合抗菌非织造布
2.
Effect of depositing process on microstructure chromium nitride coatings deposited by reactive magnetron sputtering;
反应磁控溅射沉积工艺对Cr-N涂层微观结构的影响
3.
Characterization study of Al magnetron sputtering coating on AZ31 magnesium alloy;
AZ31镁合金磁控溅射镀铝膜的性能研究
4)  RF magnetron sputtering
磁控溅射
1.
Investigation on organic light-emitting diodes with TiO_2 ultra-thin films as hole buffer layer by RF magnetron sputtering;
磁控溅射法制备TiO_2空穴缓冲层的有机发光器件
2.
ZrN films were synthesized by inductively coupled plasma(ICP)-assisted RF magnetron sputtering.
利用电感耦合等离子体(ICP)辅助射频磁控溅射技术,在Si(111)片表面制备了ZrN薄膜。
3.
The ZnO films were grown on quartz substrates by rf magnetron sputtering.
本工作利用磁控溅射技术在石英衬底上生长出沿c轴择优取向的未掺杂ZnO薄膜,利用X射线衍射,光致发光,X射线光电子谱和Hall效应测量技术,研究了退火温度对结构、电学和光学性质的影响。
5)  magnetic sputtering
磁控溅射
1.
Power supply feedback control of industrial giant target during magnetic sputtering;
工业用巨型磁控溅射靶电源反馈控制的研究
2.
Preparation and analysis of In_2O_3-SnO_2 thin films deposited by magnetic sputtering;
磁控溅射制备In_2O_3-SnO_2薄膜与分析
3.
The fabrication of plane thin-film H_2S gas sensor with magnetic sputtering method;
利用磁控溅射仪制作平面薄膜型H_2S硅微传感器
6)  Sputtering [英]['spʌtə]  [美]['spʌtɚ]
磁控溅射
1.
Experiment on Sputtering Metal Thin Film on Wood Surface;
木材磁控溅射镀膜金属试验
2.
Magnetic controlled sputtering were used to produce amorphous SmFe film,and with further annealing,nanocrytalline particles diffused in Cu base are obtained.
本文采用磁控溅射方法得到非晶SmFe薄膜 ,通过时效处理后 ,得到均匀分布在铜基体上的磁性纳米颗粒。
3.
Thin films of TiN were deposited on float glass substrates by DC reactive magnetron sputtering.
用直流反应磁控溅射法在浮法玻璃基片上制备了TiN薄膜。
补充资料:Celliton Pink RF
分子式:C15H11NO3
分子量:253.26
CAS号:暂无

性质:粉末。在浓硫酸中呈橙色,稀释后呈红色沉淀。

制备方法:由1-氨基蒽醌先进行溴化,而后在硫酸介质中水解,在烧碱存在下用甲醇实现甲氧基化,再经过滤、研磨、干燥及商品化处理而制得。原料消耗(kg/t)1-氨基-2,4-二溴蒽醌 1500甲醇 2500二甲基亚砜 3200盐酸 650硫酸 8800烧碱 1070

用途:用于涤纶及其混纺物的印染,也可用于乙酸纤维、三乙酸纤维、锦纶和腈纶的印染,还可用于氯纶及塑料的着色。

说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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