1) polishing mechanism
抛光机理
1.
The polishing mechanism and application of CMP are summarized.
通过回顾化学机械抛光技术的发展历史,概述了化学机械抛光作用机制与实际应用情况,着重阐述了几种重要抛光浆料(如CeO2、SiO2、Al2O3抛光浆料)的优缺点、抛光机理及其国内外新近制备方法,进一步展望了化学机械抛光技术的发展前景与新型抛光浆料的开发方向。
2.
At the same time, the polishing mechanism of Mg al.
同时分析了镁合金的抛光机理,抛光中压力、转速和抛光液流量参数对抛光过程的影响,利用Olympus显微镜对抛光前后镁合金表面进行观察,通过合理控制工艺参数,能够得到较佳的镁合金抛光表面,远优于单一的机械加工,为镁合金抛光工艺和进一步研究抛光液的配比奠定了基础。
3.
Analyzing the understanding of previous polishing mechanism,our comprehension and hypothesis of material removal mechanism of super smooth surface polishing are enunciated.
胶体SiO2抛光LBO晶体获得无损伤的超光滑表面,结合前人对抛光机理的认识,探讨了超光滑表面抛光的材料去除机理,分析了化学机械抛光中的原子级材料去除机理。
2) acid polishing mechanism
酸抛光机理
1.
Through comparision of polishing experiments on the corrosion of hydrochloric acid of various white marble, the polished surface feature and the acid polishing mechanism of carbonate jade are analysed, and the compounding of acid liquid and the factors influencing on the effect of acid polishing are discussed.
通过对多种白色大理石的盐酸腐蚀抛光实验比较,分析了碳酸盐质玉石的酸抛光机理及其抛光面特征,并探讨了酸液的配制和影响酸抛光效果的各种因素。
3) Polishing treatment
抛光处理
1.
From further study,the polishing treatment bond coats show better TGO adherence and lower alumina growth rate.
采用电镀和渗铝方法制备镍基合金的铂改性铝化物粘结层,并对涂层表面进行1μm表面抛光处理,研究1 100℃空气循环高温氧化生成的氧化铝层的表面形态和断面结构。
4) polishing machine
抛光机
1.
Improving of optical polishing machine based on fuzzy control;
基于模糊控制技术的光学抛光机床的改造
2.
According to the analysis of the structure of polishing pad,polishing machine and polishing slurry,the merits of fixed abrasives (FA)CMP were presented.
经过对传统化学机械抛光技术的研究与分析,指出了目前ULSI制造中使用的传统化学机械抛光技术的缺点,通过对固结磨料化学机械抛光中的抛光垫结构、抛光机原理及抛光液的分析,得出了固结磨料化学机械抛光技术的优点,同时还对硅片固结磨料化学机械抛光的缺陷进行了研究。
3.
The tradition optical lens polishing machine existence main axle swinging inertia is big, the rack easy to have the vibration, the complete machine stability inferior serious influence product precision question.
传统光学透镜抛光机存在主轴摆动惯性大,机架易产生振动,整机稳定性差等严重影响产品精度的问题。
5) mechanical polishing
机械抛光
1.
The study on the optimizational technology of the large area free-standing diamond films mechanical polishing;
大面积金刚石自支撑膜机械抛光的优化工艺研究
2.
This paper introduced a precision polishing experiment study on H62(φ80mm)brass with traditional precision mechanical polishing method.
本文采用传统的精密机械抛光方法,对H62黄铜(φ80mm)进行了精密抛光实验研究。
3.
On the basis of briefly reviewing the polishing process techniques of chemically vapor deposited diamond films,an primary investigation on mechanical polishing processes for chemically vapor deposited diamond thick films was carried out using automatic polishing, as well as during polishing process, were observed by means of scanning electron microscope.
在简要综述 CVD金刚石膜光整加工方法的基础上 ,在自动抛磨机上对 CVD金刚石厚膜进行了初步的机械抛光工艺研究 ,借助扫描电子显微镜 (SEM)对抛光前后及抛光过程中 CVD金刚石膜的表面形貌变化进行了观察 ,初步讨论了 CVD金刚石的去除过程。
6) polishing machine tool
抛光机床
1.
Modeling and identification for force control system of robotic flexible polishing machine tool;
机器人柔性抛光机床的力控制系统的建模与辨识
补充资料：抛光剂,抛光混合剂
CAS：68909-13-7
中文名称：焙烧提浓的氟碳铈镧矿；抛光剂,抛光混合剂
英文名称：Bastnaesite, calcined concentrate；Calcined bastnasite；bastnaesite, calcined conc.；polishing compound；Bastnaesite,calcined concentrate
中文名称：焙烧提浓的氟碳铈镧矿；抛光剂,抛光混合剂
英文名称：Bastnaesite, calcined concentrate；Calcined bastnasite；bastnaesite, calcined conc.；polishing compound；Bastnaesite,calcined concentrate
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条