1) atomic layer deposition
![点击朗读](/dictall/images/read.gif)
原子层淀积(ALD)
2) atomic layer deposition
![点击朗读](/dictall/images/read.gif)
原子层淀积
1.
Preparing aluminum nitride thin film by atomic layer deposition
![点击朗读](/dictall/images/read.gif)
氮化铝薄膜的原子层淀积制备及应用
2.
Density functional theory was employed to investigate atomic layer deposition(ALD)mecha-nism of zirconia on Si(100)-2×1 surface with single and double hydroxyl groups.
用密度泛函方法研究了ZrO2在羟基预处理的Si(100)-2×1表面原子层淀积(ALD)初始反应过程的反应机理,ZrO2的ALD过程包括两个前体反应物ZrCl4和H2O交替的半反应。
3.
And atomic layer deposition(ALD) has become more and more popular due to its precise thickness control in film deposition.
而原子层淀积(ALD)工艺由于其精确的厚度控制,在high-k栅介质的集成工艺上受到了广泛关注。
3) ALD
![点击朗读](/dictall/images/read.gif)
原子层淀积
1.
Due to many outstanding characters of ALD,it has been widely used in many fields within Microelectronics.
比如当特征尺寸减小到45nm以下时,等效栅氧化层的厚度将会变得小于1nm,隧穿电流开始非常显著,这就需要采用一种新的技术—原子层淀积(Atomic Layer Depositon,简称ALD)制备高k栅介质。
2.
Through the change of ALD process,we can deposit three kinds of HfAlO film with different Al∶Hf atomic ratio.
采用原子层淀积(ALD)的方法在Si(100)衬底上制备了铪铝氧(HfAlO)高介电常数介质,并研究了N2和NH3退火对于介质薄膜的影响。
3.
It reveals that atomic layer deposition(ALD)is one of best method for making HfO2 dielectric materials.
比较了HfO2介质材料的电学性能、热稳定性能及可靠性能,综述了HfO2介质材料的前景,指出原子层淀积(ALD)是制备HfO2介质材料的最好方法之一。
4) atomic layer deposition
![点击朗读](/dictall/images/read.gif)
原子层沉积
1.
Surface reaction mechanisms of HfO_2-Al_2O_3 alloy grown on silicon by atomic layer deposition:A density functional theory study;
HfO_2和Al_2O_3混合原子层沉积反应机理的密度泛函理论研究
2.
The principle of atomic layer deposition technique (ALD)comparing with conventional film deposition processes,especially in vacuum originated and deposition mechanism,are discussed.
讲述原子层沉积技术原理与特点的同时,进一步论述了它在沉积机理和实验真空度这两方面与传统薄膜沉积工艺的异同;综述了此技术在铁电薄膜制备研究方面的最新进展,前驱体的制备与选择、薄膜缺陷的控制以及表面化学反应动力学依然是当前原子层制备铁电薄膜研究的重点;最后展望了原子层沉积技术制备铁电薄膜的发展方向。
3.
The miniaturization of semiconductor devices accelerates the development of atomic layer deposition(ALD) technology.
首先简述原子层沉积(ALD)技术的发展背景,通过分析ALD的互补性和自限制性等工艺基础,介绍了它在膜层的均匀性、保形性以及膜厚控制能力等方面的优势,着重列举ALD在半导体互连技术、高k电介质等方面的应用。
5) illuvial layers of CaCO 3
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CaCO_3淀积层
6) 2 illuvial layers
![点击朗读](/dictall/images/read.gif)
双层淀积
1.
On the basis of the materials in chemical analysis and investigating in field, 4 kinds of 2 illuvial layers have been asertained in this paper.
本文确定了黄土中古土壤有四种双层淀积类型。
补充资料:雷淀
1.即雷池。
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
参考词条