1) Spot annealing treatment
局部退火处理
2) local annealing
局部退火
3) annealing
[英][ə'ni:liŋ] [美][ə'nilɪŋ]
退火处理
1.
The effect of annealing on microstructure and high temperature erosion property of arc-spraying coatings containing nanosized ceramic powders;
退火处理对含纳米陶瓷粉电弧喷涂层组织结构与高温冲蚀性能的影响
2.
Effect of annealing on the oxidation behavior of peened 1Cr18Ni9Ti alloy;
喷丸及退火处理对1Cr18Ni9Ti合金抗高温氧化性能的影响
3.
Effect of Annealing on the Magnetism of Sintered NdFeB Magnets;
退火处理对烧结Nd-Fe-B永磁体磁性能的影响
4) annealing treatment
退火处理
1.
Effect of annealing treatment on microstructure and properties of as-cast austenitic-bainite nodular iron by permanent mold casting;
退火处理对金属型铸态奥—贝球铁组织和性能的影响
2.
Influence of annealing treatment on microstructure and properties of AZ31 magnesium alloy sheet processed by equal channel angular rolling;
退火处理对等径角轧制AZ31镁合金板材组织与性能的影响
3.
Effects of annealing treatment on electrochemical properties of Re_(0.92)Mg_(0.08)Ni_(2.81)Mn_(0.10)Co_(0.51)Al_(0.11) alloy electrodes;
退火处理对Re_(0.92)Mg_(0.08)Ni_(2.81)Mn_(0.10)Co_(0.51)Al_(0.11)贮氢合金电化学性能的影响
5) anneal treatment
退火处理
1.
The red copper has been treated with anneal treatment,the mechanical properties testing and microstructure analysis have been done.
对紫铜进行了退火处理,并进行了力学性能试验和金相组织分析,结果表明退火处理能改善紫铜的组织和性能,对后续的锻造生产有指导意义。
2.
After anneal treatment,SEM pattern of the sample showed an amorphous multi-hole "beehive"-like structure.
采用溶胶-凝胶方法制备了从1%~10%不同浓度Eu离子掺入的SiO2玻璃,并对于不同浓度掺杂和退火处理对其结构和发光性能的影响进行了研究。
3.
This paper takes a research on effect of anneal treatment on ferroelectric piezoelectric anti-aging and anti-fatigue of PZT-5H ferroelectric ceramics.
研究了退火处理对 PZT-5H 陶瓷铁电、压电性能以及抗老化和抗电疲劳性能的影响。
6) annealing process
退火处理
1.
Effect of Annealing Processing on Structure and Properties of Ferritic Stainless Steel 00 Cr12Ti;
退火处理对00Cr12Ti铁素体不锈钢组织和性能的影响
2.
The photoelectric property and thermoelectromotive force of CdIn_2O_4 or CIO thin film deposited by way of DC reactive magnetron sputtering process were investigated, as well as the effects of the O_2 concentration in reacting gas and annealing process on the property of CIO films.
研究了直流磁控反应溅射制备三元化合物CdIn2O4薄膜(简称CIO膜)的光电性质和温差电动势,及其反应气体中氧浓度和退火处理对CIO膜性质的影响。
3.
The photoelectric property and thermoelectromotive force of CdIn2O4 or CIO thin film deposited by way of DC reactive magnetron sputtering process were investigated, as well as the effects of the O2 concentration in reacting gas and annealing process on the property of CIO films.
研究了直流磁控反应溅射制备三元化合物CdIn_2O_4薄膜(简称CIO膜)的光电性质和温差电动势,及其反应气体中氧浓度和退火处理对CIO膜性质的影响。
补充资料：软化退火(见低温退火)
软化退火(见低温退火)
soft-annealing
rU0nhUO tUihUO软化退火(soft一annealing)见低温退火。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条