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1)  Auger electron emitter
俄歇电子发射体
1.
Objective To investigate the radiation effect of Auger electron emitter 67 Ga-EDTMP on the human osteosarcoma cell line (HOS-8603).
目的 研究俄歇电子发射体67Ga-EDTMP对人骨肉瘤细胞株 (HOS - 86 0 3)的辐射效应 ,探讨67Ga作为原发肿瘤和骨转移癌内照射治疗核素的可能性。
2)  Auger electron emission
俄歇电子发射
3)  Auger electron
俄歇电子
1.
Auger electron energies and their absolute intensities calculation associated with electron capture decay;
伴随电子俘获衰变的俄歇电子能量及强度计算
2.
Objective To investigate the action and mechanism of Auger electron emitting from125IUdR on DNA-targeting radiotherapy ofC6 glioma in rat based on establishment of a C6/Wistar glioma model.
目的在建立C6/Wistar胶质瘤大鼠模型的基础上,研究125IUdR介导俄歇电子释放对大鼠C6胶质瘤DNA靶点放疗后的肿瘤细胞凋亡。
3.
Objective To investigate the action and mechanism of Auger electron emitting from ~(125) IUdR on DNA-targeting radiotherapy of C6 glioma in rat based on establishment of a C6/Wistar glioma model.
目的在建立C6/Wistar胶质瘤大鼠模型的基础上,研究125IUdR介导俄歇电子释放对大鼠C6胶质瘤DNA靶点放疗的作用及其机制。
4)  Auger electron spectroscopy
俄歇电子谱
5)  Auger electron peak
俄歇电子峰
6)  AES
俄歇电子谱
1.
XPS and AES Investigation of GaN Films Grown by MBE;
MBE生长氮化镓薄膜的X光电子谱和俄歇电子谱分析(英文)
2.
It is well known that low energy ion sputtering plaps an important role in quantification of surface composition by AES and XPS,such as to clean surface contamination and obtain depth profiles by low energy ion beam sputtering,ect.
由于离子溅射改变了固体表面化学成分,引起表面成分的再分布,使俄歇电子谱、X射线光电子谱以及二次离子质谱等表面分析手段,对溅射后固体表面成分的定量分析结果与实际结果有较大的差别。
补充资料:歇后体
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