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1)  unbalanced closed field
非平衡闭合磁场
2)  Closed-field unbalanced magnetron sputtering
闭合场非平衡磁控溅射
1.
Closed-field unbalanced magnetron sputtering (CFUBMS) and 90° bend toroidal duct magnetic filtered cathodic vacuum arc (FCVA) were chosen to prepare DLC films for they are the better deposition technologies for industrial application, and the influences of deposition parameters on the structures and properties were investigated.
采用了闭合场非平衡磁控溅射和90°弯管磁过滤阴极弧两种适合产业化的技术,在单晶硅基体上沉积DLC膜,研究了工艺参数对DLC膜的结构和性能的影响。
3)  Closed field unbalanced magnetron sputter ion plating
闭合场非平衡磁控溅射离子镀
4)  closed field unbalanced magnetron sputter iron plating
非平衡闭合磁控溅射
1.
The graphite-like composite coatings were deposited using closed field unbalanced magnetron sputter iron plating technique.
使用非平衡闭合磁控溅射技术制备了类石墨复合镀层,采用SEM、AFM观察了不同渗碳淬火基片不同表面状态类石墨复合膜表面和断口形貌,采用XRD分析了镀层的相结构。
5)  Unbalance magnetron field
非平衡磁场
6)  magnetic field unbalance coefficient
磁场非平衡度
补充资料:非想非非想处天
1.佛教语。即三界中无色界第四天。此天没有欲望与物质﹐仅有微妙的思想。
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