1) electron beam direct-write exposure
电子束直写曝光
2) electron beam direct-writing lithography
电子束直写光刻
1.
Patterned media with nickel nanopillar arrays as the magnetic recording units was prepared with electron beam direct-writing lithography and electrodeposition.
以电子束直写光刻图形为模版,采用直流电沉积和数值模拟的方法,研究了镍纳米柱阵列图案化磁记录介质的制备工艺和模版电沉积过程中的沉积不均匀问题。
3) electron beam lithography
电子束曝光
1.
Research of figures with high aspect ratio made by electron beam lithography system;
利用电子束曝光系统制作高深宽比图形的研究
2.
Studies of energy dissipation distribution in low-energy electron beam lithography by Monte Carlo method;
Monte Carlo方法研究低能电子束曝光沉积能分布规律
6) electron beam direct writing
电子束直写
1.
Based on the analysis, a new method is presented to fabricate the BSG with electron beam direct writing.
并在此基础上 ,采用电子束直写加工光栅掩模 ,制作取样光栅。
2.
The mold manufacturing is the key part in imprint lithography process, which includes electron beam direct writing, stepping molding, and the conversion from small mold to big mold.
采用电子束直写、步进制模、压印翻制的压印模具生产工艺 ,其模具的制造是目前面临的难点。
补充资料：写鞚
1.放松辔头。谓纵马奔驰。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条