1) multi target sputtering
多靶溅射
2) multi_component sputtering
多元靶溅射
3) More target sputtering together
多靶共溅射
4) magnetron plasma sputtering
多靶磁控溅射
1.
Au/SiO_2 nano-composite multilayer thin films were prepared by magnetron plasma sputtering.
利用多靶磁控溅射技术制备了Au/SiO2纳米颗粒分散氧化物多层复合薄膜。
5) multi-target IBS
离子束多靶溅射
6) sputtering target
溅射靶材
1.
The current market condition and development tendency of high purity copper sputtering targets were introduced.
简要介绍了高纯铜溅射靶材目前的市场情况、现状、应用领域和未来高纯铜溅射靶材发展趋势;并对高纯铜溅射靶材的特性要求以及微观组织控制做了简单的阐述。
2.
ZAO thin films have a wide application prospect owing to its perfect optical and electrical characteristics(ZAO thin films prepared with a sputtering target doped with Al_2O_3 (3% mass fu.
由于其优良的光电特性(用掺杂Al2O3质量分数达3%的溅射靶材可制备电阻率达4。
补充资料：多功能磁控溅射镀膜机
多功能磁控溅射镀膜机
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说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条