1) filtered cathode arc deposition
过滤式阴极电弧沉积
1.
The diamond like carbonfilm is achieved by filtered cathode arc deposition.
采用过滤式阴极电弧沉积的方法获得类金刚石薄膜 。
2) filtered vacuum arc deposition
过滤式阴极电弧沉积
1.
Diamond like carbon thin film is successfully deposited on silicon, titanium and stainless steel substrate at low temperature in a filtered vacuum arc deposition system.
详细介绍了过滤式阴极电弧沉积设备，并研究了磁场对电弧稳定性的影响。
2.
Diamond like carbon (DLC) films was grown successfully on silicon, titanium and high speed steel (HSS) substrate at low temperature in a filtered vacuum arc deposition system.
本文研究了过滤式阴极电弧沉积方法获得的类金刚石薄膜。
3) FCVPD(filtered cathode vacuum arc deposition)
磁过滤阴极真空弧沉积
4) filtered cathodic vacuum arc deposition
过滤阴极真空弧沉积
1.
Ta-C films are synthesized by filtered cathodic vacuum arc deposition method.
用磁过滤阴极真空弧沉积 (FCVAD)方法在Si衬底上合成了Ta C薄膜 ,Raman光谱和光电子能谱 (XPS)分析表明衬底加 80～ 10 0V负偏压时合成的Ta C薄膜sp3 键所占比例最高 ,可达 80 %以上 ,并且在Ta C薄膜表面存在一sp3 键所占比例较低的薄层 。
5) Filtered cathodic vacuum arc(FCVA)
过滤阴极真空电弧沉积(FCVA)
6) cathodic micro-arc electrodeposition
阴极微弧电沉积
1.
An alumina coating with a thickness of 100μm on a titanium substrate was prepared by cathodic micro-arc electrodeposition.
采用阴极微弧电沉积在钛表面生成了厚度达100μm的氧化铝涂层,研究了不同电压下涂层的结构和组成,分析了涂层的生长规律和形成过程。
2.
Alumina coatings on titanium substrate were prepared by cathodic micro-arc electrodeposition.
用阴极微弧电沉积在钛表面生成Al2O3涂层,探讨溶液组成、放电电压及时间对涂层形貌、相组成及生长速率的影响。
补充资料：盘式过滤机过滤车间
盘式过滤机过滤车间
遴盘式过滤机过滤车间
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条