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1)  sub-micron gratings
亚微米光栅
1.
Research on transmission diffraction characteristics of sub-micron gratings for light guide plate;
用于光导板的亚微米光栅透射衍射特性分析
2.
By using rigorous coupled-wave theory,the relationship between the first order transmission efficiency and the depths of grooves and the incidence angles is analyzed when lights transmit from sub-micron gratings′ optically denser medium to optically thinner medium.
提出了利用亚微米光栅制作光导板的方法,用严格耦合波理论计算分析了亚微米光栅从光密介质到光疏介质的1级透射衍射效率与光栅槽深、入射角度的关系,讨论了在满足基底全反射条件的入射角时对应于R、G、B三原色光的亚微米光栅(0。
2)  sub-micron grating
亚微米光栅
1.
Design and fabrication of sub-micron grating with given filter character for anti-counterfeiting;
具有特定滤波特性的防伪用亚微米光栅的设计和制作
2.
The light-guiding properties of sub-micron gratings have been studied based on the linear part of the relationship curves.
8nm的亚微米光栅组成,用红、绿、蓝三色LED作为光源,通过光栅空频控制出射光方向、槽深调节衍射效率,达到导光棒出射光源的均匀性。
3.
Firstly, the diffraction properties of sub-micron gratings is analyzed using rigorous coupled-wave theory, including the relationship of the direction of diffraction light in each grade and grating period, and the r.
文中首先利用严格耦合波理论(RCWA)分析亚微米光栅的衍射特性,即各级次衍射光方向与光栅周期及入射光角度的关系,亚微米光栅的衍射效率与槽深的关系。
3)  deep sub micron grooved gate PMOSFET
深亚微米槽栅PMOSFET
1.
Based on the hydrodynamic energy transport model, the influence of substrate doping density on performance for deep sub micron grooved gate PMOSFET is studied using two dimensional device simulator MEDICI and is compared to that of the counterpart conventional planar device.
基于流体动力学能量输运模型 ,利用二维器件仿真软件MEDICI,对衬底掺杂浓度不同的深亚微米槽栅PMOSFET特性进行了研究 ,并与相应平面器件的特性进行了对比 。
4)  submicron photolithography
亚微米光刻
1.
Optical proximity correction for improving pattern quality in submicron photolithography;
光学邻近校正改善亚微米光刻图形质量
5)  submicron lithography
亚微米光刻
1.
In order to study the feasibility of submicron lithography using second harmonic light of a copper vapor laser(CVL), a 1∶1 catadioptric projection lens, and an illumination system which consists of a rotating diffuser and a ligth pipe, are designed and constructed.
3nm的铜蒸气激光倍频光在亚微米光刻中的可行性,设计了带宽为1nm的11折反射式投影光刻物镜和一个带散射板的光管式均匀照明系统,获得了0。
2.
Experimental results of deep submicron lithography with a excimer laser are reported in this paper.
报道用远紫外准分子激光进行亚微米光刻的实验结果。
6)  submicron photolithography
亚微米曝光
补充资料:2,2'-[亚甲基二(2,1-亚苯基氧亚甲基)]二环氧乙烷
CAS:54208-63-8
分子式:C19H20O4
中文名称:双酚二环甘油醚
2,2'-[亚甲基二(2,1-亚苯基氧亚甲基)]二环氧乙烷
英文名称:2,2'-[methylenebis(2,1-phenyleneoxymethylene)] bis-Oxirane
Methylenebis(o-phenol), 3-propylene oxide ether
2,2'-[methylenebis(2,1-phenyleneoxymethylene)]bis-oxiran
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
参考词条