1)  photoresists
光敏抗蚀剂
2)  photosensitive
光敏
1.
Five photosensitive,widely compatible paddy rice varieties and 4 upland varieties were crossed in a p×q partial diallel cross experiment,the combining ability of 9 main agronomic traits of the F_1s were analyzed,and the general combining ability effect of the parent varieties and the specific combining ability effect of the cross combinations were calculated.
选择有代表性的5个光敏、广亲和水稻品种和4个旱稻品种按照p×q不完全双列杂交配制杂交组合,并对其F1代的株高、穗长、单株结实率等9个主要农艺性状进行了配合力分析,考查了亲本的Gca效应和杂交组合的Sca效应值。
3)  photosensitization
光敏
1.
The working theory of the key components, including to the two-mike s choice, the difference magnifying, the band-pass filter, the photosensitization, the output of the strong current are accounted for, and the flow chart of the program is analyzed.
详细说明了关键部件的工作原理,双话筒的选用、差分放大电路、带通滤波电路、光敏电路、强电输出电路;并对程序流程图进行了分析。
2.
The photosensitization study of the novel products were carried out via the ultraviolet radiation at the wavelength of 254 nm.
并对产物的二氯甲烷溶液在254 nm紫外灯光照前后的紫外吸收进行了测量,结果表明这些化合物显示了良好的光敏变色性能。
4)  photo-sensitive
光敏
1.
The theory and methods of temperaturecompensation in photo-sensitive, magneto-sensitive, force-sensitive Z-elements are particularly introduced in this paper.
本文详细地介绍了光敏Z-元件、磁敏Z-元件以及力敏Z-元件的温度补偿原理与补偿方法,供用户利用光、磁、力敏Z-元件进行应用开发时参考。
5)  photosensitivity
光敏性
1.
Study on the photosensitivity of superfine copper complex of dithiolate and 5-nitri-phenanthroline;
超细粉体二硫纶·硝基菲咯啉铜(Ⅱ)配合物的光敏性研究
2.
Study on the fluorescent property and photosensitivity of complex[Mn(S-S)(N-N)];
[Mn(S-S)(N-N)]配合物的荧光特性与光敏性研究
3.
L′=phen 5,6 dione,1,10 phenanthroline 5,6 dione;5 NO 2 phen,5 nitro 1,10 phenanthroline),and photosensitivity of CdS doped with FeLL′ are reported.
报道了新近合成的二硫纶·取代菲咯啉铁 (Ⅱ )配合物FeLL′(L =mnt2 - ,1 ,2 二氰基乙烯 1 ,2 二硫醇离子 ,L′ =phen 5,6 dione,1 ,1 0 菲咯啉 5,6 二酮 ;5 NO2 phen ,5 硝基 1 ,1 0 菲咯啉 )的电子吸收光谱、电子发射光谱及对CdS的光敏性 ,研究了FeLL′对CdS的光敏化作用与其电子光谱间的关
6)  Photosensitization
光敏化
1.
Synthesis,Characterization of Water Soluble Porphyrin and Its Photosensitization Behavior;
水溶性卟啉配合物的合成及光敏化行为
2.
A comparative study of visible light photosensitization alone and US/ photosensitization was made to evaluate their respective effectiveness for removal of hard-degraded pollutants from water with 4,4′-dibrominated biphenyl(4,4′-DBB)in the experiment,and the degradation degree was estimated by the change of ultraviolet absorption curve.
研究了单独可见光光敏化和US/光敏化处理难降解有机污染物(4,4′-二溴联苯(4,4′-DBB))的效能,并通过紫外吸收光强弱变化判断降解程度。
3.
From the perspectives of dye photosensitization,positive ion doping,negative ion doping,and new type composite photocatalyst,it investigates the preparation,photocatalysis mechanism,effects and shortcomings of the concerned material.
从染料光敏化、阳离子掺杂、阴离子掺杂及新型复合光催化剂四个方面详细探讨该类复合TiO2的制备方法、催化机理、实际效果和缺点;较系统地介绍可见光化光催化剂的研究现状、成果及前景。
参考词条
补充资料:溶剂型光敏抗蚀干膜
分子式:
CAS号:

性质:光敏抗蚀干膜有溶剂型和水溶性两种不同类型。由聚酯薄膜、感光层和聚乙烯薄膜三合一的感光膜。中间的感光层由成膜树脂、光聚合单体、光敏引发剂和多种助剂组成。其制法是将感光层的各种组分溶解于溶剂中配成胶液,在一定温度下涂布于聚酯薄膜,收卷成筒,包装成产品。使用时先将聚乙烯保护膜撕去,通过热将将感光层粘压到敷铜板上,再经紫外光曝光,显影时未感光的部分被洗去,感光部分黏附在金属表面形成图形,起抗蚀抗电镀作用。干膜涂布均匀,涂层较厚,图形边缘线条陡直,提供了很高的分辨率。采用三氯乙烷、二甲苯、乙酸丁酯等有机溶剂显影。抗蚀性能强,可耐碱、耐酸性腐蚀和电镀,性能稳定可靠。用于双面及多层电路板的生产,制作精密的耐腐蚀耐电镀图形,稳定性优于水溶性干膜。由于采用溶剂显影,成本高,毒性大,操作不便,污染环境,逐步被水溶性光敏抗蚀干膜所替代。

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