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1)  photochemical deposition
光化学沉积
1.
The performance degradation of OSR and solar array is estimated by using view factor method with consideration of photochemical deposition effects.
根据扩散理论建立保守出气速率模型,基于自由分子流理论采用角系数方法计算污染分子视线传输,考虑了光化学沉积效应,对RTV胶、白漆出气造成的OSR片、太阳电池板、天线性能退化进行了估计,发现RTV胶的污染效应较为严重,白漆的污染影响可忽略不计。
2.
Hg/Ti electrode was prepared by using elctrodeposition and photochemical deposition methode.
采用电沉积和光化学沉积法制备了钛基汞膜修饰电极。
2)  chemical vapor deposition
化学汽相沉积<光>
3)  electroless deposition
化学沉积
1.
Study of nanocrystalline Co-P alloy electroless deposition and its influencing factors on deposition rate;
化学沉积纳米晶Co-P合金及其沉积速率影响因素的研究
2.
Study on preparation of Ni-P-SiC(C) composite coatings by electroless deposition;
化学沉积法制备Ni-P-SiC(C)复合镀层的研究
3.
Effect of rare earth element on electroless deposition of cobalt-nickel-boron alloy;
稀土元素对钴-镍-硼合金化学沉积的影响
4)  electroless plating
化学沉积
1.
Impact of electroplate and electroless plating on nano-Co-B alloy functional film;
Co-B纳米合金功能膜化学沉积和电沉积的比较
2.
Test study on electroless plating of Ni-W-P/Ni-P alloys;
Ni-W-P/Ni-P合金的化学沉积试验研究
3.
The Study on the Microstructure and Properties of Electroless Plating Multicompnent Cobalt Based Soft Magnetic Film with Rare Earth Joined;
化学沉积稀土多元钴基软磁薄膜结构和性能的研究
5)  sedimentation chemistry
沉积化学
6)  chemical deposition
化学沉积
1.
Copper oxide/porous carbon composite materials were prepared by a chemical deposition method.
通过化学沉积法制备了金属铜氧化物/多孔炭复合电极材料,考察了热处理温度及金属铜氧化物负载量对其理化性能的影响。
2.
Poly(ethylene covinyl alcohol)end-capped with potassium sulfonate (EVOH-SO3 K)was synthesized by sulfonification of poly(ethyl- ene covinyl alcohol)(EVOH)with 1,3-propane suhone and was modified by toluene-2,4-diisocyanate (TDI)to get a cross-linked ionic polymer (EVOH-TSO3 K),and then the IPMC based on EVOH-TSO3 K was prepared through the method of chemical deposition.
由聚乙烯-乙烯醇(EVOH)和1,3-丙烷磺酸内酯合成了EVOH磺酸钾离子聚合物(EVOH-SO_3K),并用2,4-甲苯二异氰酸酯(TDI)对其进行了交联改性,得到TDI改性EVOH磺酸钾离子聚合物(EVOH-TSO_3K),通过EVOH-TSO_3K溶液的铸膜和化学沉积制得离子聚合物膜金属复合材料(IPMC)。
3.
A composite electrode of nickel hexacyanoferrate(NiHCF),graphite power,and methyltrimethoxysilane(MTMOS) was prepared by chemical deposition technology.
利用化学沉积技术制备了NiHCF/石墨粉/MTMOS复合修饰电极,研究了NiHCF/石墨粉/MTMOS复合修饰电极作为安培型L—半胱氨酸传感器的电化学行为。
补充资料:暗光化学
分子式:
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性质: 激发态反应并非由于吸收电磁辐射所致,而由化学作用或酶促作用产生的激发态发生的光化学过程。此术语已建议不再使用。

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