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1)  Fixed Abrasive Pad
固结磨料抛光垫
2)  fixed-abrasive polishing
固结磨料抛光
1.
The results showed that under the same polishing parameters,the particle size exerted an important influence on MRR and surface quality during unfixed-abrasive polishing,but played a less role during fixed-abrasive polishing.
结果表明:在相同的抛光工艺参数下,磨粒粒径在游离磨料抛光中对材料去除率和抛光后表面质量作用显著,而在固结磨料抛光中作用不显著;采用金刚石固结磨料抛光垫抛光能获得表面粗糙度约为Ra1。
3)  fixed soft abraders grinding-polishing
固结软磨料磨抛
4)  polishing without abrasive
无磨料抛光
5)  fixed abrasive
固结磨料
1.
A model of material removal rate with fixed abrasive pad;
固结磨料抛光垫作用下的材料去除速率模型
2.
Some methods of preparing fixed abrasive pad were suggested.
分析了传统游离磨料研磨抛光存在的缺点和固结磨料的研磨抛光的优点;阐述了固结磨料研磨抛光的材料去除机制以及固结磨料研磨盘抛光技术在氮化硅陶瓷加工、半导体制程中的应用;介绍了多种固结磨料研磨盘、抛光垫的制作方法;并展望了固结磨料的研磨抛光的发展趋势。
6)  polishing [英]['pɔliʃ]  [美]['pɑlɪʃ]
磨(抛,擦,打)光,磨料
补充资料:抛光剂,抛光混合剂
CAS:68909-13-7
中文名称:焙烧提浓的氟碳铈镧矿;抛光剂,抛光混合剂
英文名称:Bastnaesite, calcined concentrate;Calcined bastnasite;bastnaesite, calcined conc.;polishing compound;Bastnaesite,calcined concentrate
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