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1)  ultra-precision lapping and polishing
超精密研磨和抛光
1.
This paper aims at the circs of that it mainly depends on the workers experience during the process of ultra-precision lapping and polishing, and exists strong subjectivity, no considering choosing procedure at the point of view of saving time, so a resolving method to design the system of process optimum and intelligent control was presented.
本文针对超精密研磨和抛光加工中主要依靠工人加工经验进行实际操作的情况,指出加工中存在极大主观性,没有从节约加工时间的角度考虑加工工艺的选择问题,因此提出建立工艺优化和智能控制系统的解决方案。
2)  Precision lapping and polishing
精密研磨抛光
3)  ultra-precise lapping-polishing
超精密研抛
1.
This paper introduced lapping-polishing and ultraprecise lapping-polishing technology,analyzed the development of lapping-polishing as well as the present state of ultra-precise lapping-polishing technology development,and listed some methods of ultra-precise lapping-polishing.
本文介绍了研抛和超精密研抛技术,分析了研抛技术的发展过程和超精密研抛技术的发展现状,列举了几种超精密研抛方法,重点说明了超声波研抛的特点。
4)  superpolishing
超精密抛光
1.
The Primary Study of Superpolishing of LiGaO 2 Single Crystal for a Substrate of GaN Thin Film;
GaN 用衬底材料 LiGaO_2 晶体超精密抛光的初步实验
2.
The definition of supersmooth surfaces and the factors influencing the superpolishing quality are presented in this paper.
超精密抛光技术是实现超光滑表面的主要方法。
5)  ultra-precision polishing
超精密抛光
1.
This paper introduces the operating scheme of ultra-precision polishing machine and its control requirements.
介绍了超精密抛光机的工作原理及其控制要求,通过控制规则可调整的模糊控制技术解决控制系统非线性与保证控制精度的方法,并应用DSP实现控制系统。
2.
In view of this, this thesis proposes the use of abrasive flowing machining technology for ultra-precision polishing of nozzle.
鉴于此,本文提出了采用磨粒流加工技术对喷油嘴进行超精密抛光。
3.
Surface roughness of supper-smooth polishing glass is nano-scale,and working precision of ultra-precision polishing glass is molecular/atomic scale.
超光滑抛光玻璃表面粗糙度为纳米量级,超精密抛光加工精度达到分子级或原子级。
6)  super precise lapping
超精密研磨
1.
To tackle the problem in the course of super precise lapping and polishing,the expert system to direct the operation of(super) precising lapping and polishing is designed.
针对超精密研磨和抛光加工过程中出现的问题,设计出指导研磨和抛光加工过程的专家系统。
补充资料:研磨抛光材料
分子式:
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性质:集成电路、半导体器件中最重要的基础材料是硅片、硅片表面状况直接影响集成电路及器件的质量、成品率,加工硅片表面的材料称作研磨抛光材料。它包括磨料、磨液、抛光液等。

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