1) deposit overpressure
沉积型超压
2) geopressured deposit
高压型沉积
3) sedimentary overlap
沉积超覆
1.
Early stage sedimentation of basin evolvement during Mesozoic went through an overlapping process from continental to marine facies, sedimentary overlap started from the alluvial/fluvial facies, along with intrusion, eruption and pyroclaistic sedimentation, reflecting a upward deepened transgression sequence, which indicates a rift basin.
藏北羌塘盆地东部地区三叠系巴贡组之上沉积超覆了一套火山岩-火山碎屑岩。
4) deposition voltage
沉积电压
1.
Influence of deposition voltage on nanoporous ZnO films by electrochemical synthesis;
沉积电压对电化学合成纳米ZnO多孔薄膜的影响
2.
The influence of deposition voltage on the phase composition and microstructure of HAp coatings was investigated.
采用水热电沉积法在碳/碳复合材料表面制各了羟基磷灰石(hydroxyapatite,HAp)涂层,用X射线衍射、扫描电子显微镜,万能材料试验机等测试手段对涂层进行了表征,研究了沉积电压对HAp涂层晶相和显微结构的影响。
3.
The effect of deposition voltage on auxiliary heat PCVD-TiN coatings has been studied.
研究了不同的沉积电压对辅助加热式PCVD -TiN涂层的影响。
5) deposition pressure
沉积压力
1.
The effect of deposition pressure on the properties of PC film;
沉积压力对Parylene C膜性能的影响
2.
The structure and properties of the films during the course of deposition and polymerization were dominated by deposition pressure.
采用化学气相沉积法制备的聚氯代对二甲苯(PPXC)薄膜具有优异的耐溶剂腐蚀及气体阻隔性能,其沉积聚合过程中,沉积压力对膜的结构与性能具有显著影响。
3.
Effects of deposition pressure on structure and properties of thin film were investigated using XRD,SEM,UV-Vis spectrometer and FT-IR four-probe resistivity meter.
采用射频(RF)磁控溅射方法在玻璃衬底上制备了氢化纳米硅薄膜,研究了沉积压力(4~9 Pa)对薄膜结构和性能的影响。
6) deposition pressure
沉积气压
1.
To lower the surface roughness of diamond thin films by improving the CVD depositing technology, two kinds of new technical methods are proposed by appropriately increasing the carbon source concentration and controlling the deposition pressure.
为通过改进CVD沉积工艺减小金刚石薄膜表面粗糙度 ,提出了适当提高碳源浓度和合理控制沉积气压两项新的工艺方法 ,并通过切削试验研究了其对金刚石薄膜刀具耐用度及切削性能的影
2.
For the diamond films prepared at high deposition pressure,scanning electron microscope images show clearly the crystals and the Raman spectra have sharp peaks at 1332 cm-1,which shows good quality of diamond films.
研究了微波化学气相沉积中沉积气压对金刚石薄膜生长速率和质量的影响。
3.
The influence of different substrate temperature and different deposition pressure on the crystallinity of GaN films are systematically studied by X-ray Diffraction(XRD),Atomic Force Microscope(AFM).
研究表明,在750℃的沉积温度时,GaN薄膜的结晶质量较高;在20 Pa以下的沉积气压下,GaN薄膜的晶体质量随着沉积气压的升高而提高。
补充资料:冲击波超压与动压