1) Scan projection mask alignment system
扫描投影式光刻机
2) scanning projection lithography tool
扫描投影光刻机
3) step-and-scan lithography system
步进扫描投影光刻机
1.
Recent progress in technology of wafer stage and reticle stage used in step-and-scan lithography system is introduced, and the overlay accuracy and the accuracy of the overall system are analyzed.
着重介绍了当前国外步进扫描投影光刻机的工件台和掩模台的发展状况,并对套刻精度和整机精度进行了分析。
4) scanning projection printing
扫描式投影曝光
5) step-and-scan lithography
步进扫描投影光刻
1.
Exposure dose control for step-and-scan lithography;
步进扫描投影光刻机中的曝光剂量控制技术研究
6) the step and scan lithography
步进扫描式光刻机
1.
According to the vibration characteristic of the step and scan lithography,the vibration reduction system of the vibration isolation platform is designed,and the experimental research on its active vibration control is conclucted.
根据步进扫描式光刻机的振动特点,设计隔振试验平台的减振系统,并对试验平台的主动减振系统进行测试研究。
补充资料：开放式磁共振扫描机
开放式磁共振扫描机
磁共振成像设备类型之一。传统的磁共振成像设备采用圆筒式封闭型磁体，水平磁场。开放式磁共振成像设备则采用C-臂形、桥架形、塔柱形等设计，使磁体的三面或四面是开放的。此类设备采用的是垂
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条