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1)  Magnetron sputtering machine
磁控溅射镀膜机
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2)  Magnetron sputtering
磁控溅射镀膜
1.
This design aims at the characteristics of magnetron sputtering deposition, and mainly ameliorate the design of the chamber of the magnetron sputtering machine.
本设计主要对磁控溅射镀膜机真空室进行改进设计,以改善磁控溅射镀膜的工艺条件。
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3)  magnetron sputtering & coating technique
磁控溅射镀膜技术
1.
The magnetron sputtering & coating technique has been widely used in the film preparation field,and the design of the control system has important influence on the stable operation of magnetron sputtering & coating equipment.
磁控溅射镀膜技术在薄膜制备领域广泛应用,控制系统的设计对磁控溅射镀膜设备的稳定运行有着重要的影响。
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4)  SCS
太阳能真空集热管磁控溅射镀膜机
1.
Design of SCS Control System Based on FPGA;
基于FPGA的太阳能真空集热管磁控溅射镀膜机控制系统的设计
5)  magnetron sputter ion plating
磁控溅射离子镀
1.
Electrochemical corrosion behaviors of depleted uranium coated with niobium deposited by magnetron sputter ion plating were studied by electrochemical technology, scanning electron microscope (SEM) and X–ray energy dispersive spectroscope (EDS).
利用电化学测试技术、扫描电镜(SEM)及X射线能谱(EDS)对磁控溅射离子镀铌贫铀的电化学腐蚀行为进行了研究。
2.
An experiment of depositing TiN coating on the surface of HSS W18Cr4V by magnetron sputter ion plating (MSIP) method was carried out.
采用磁控溅射离子镀法(MSIP)对高速钢W18Cr4V进行了TiN镀膜试验,对镀膜后试样的各项性能进行了测试分析,并对溅射时间、氮分压、溅射电流等工艺参数对TiN膜层的显微组织、厚度、硬度和耐磨性的影响进行了研究,确定了可获得最佳涂层综合性能的镀膜工艺参数。
3.
By using the physical vapor deposition(PVD) coating technology of closed field unbalance magnetron sputter ion plating(CFUBMSIP),the high-speed steel(HSS) twist drills with graded CrAlTiN coatings are made.
用闭合场非平衡磁控溅射离子镀PVD涂层工艺在高速钢麻花钻上沉积了CrA lTiN梯度涂层。
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6)  magnetron sputtering ion plating
磁控溅射离子镀
1.
Aluminum coating was prepared by magnetron sputtering ion plating(MSIP) with pulsed bias on depleted uranium surface.
采用脉冲偏压磁控溅射离子镀(MSIP)技术在贫铀表面制备铝镀层,利用电化学测试技术、扫描电镜(SEM)及X射线能谱(EDS)对铝镀层在50μg/g Cl-水溶液中的电化学腐蚀行为进行研究。
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补充资料：多功能磁控溅射镀膜机


多功能磁控溅射镀膜机


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