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1)  magnetic field unbalance coefficient
磁场非平衡度
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2)  Unbalance magnetron field
非平衡磁场
3)  unbalanced closed field
非平衡闭合磁场
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4)  unbalanced coefficient of magnetron
磁控管非平衡度
1.
The SEM,surface roughness tester and XRD was used respectively to analyze the influence of unbalanced coefficient of magnetron on the growth of Cr film under the magnetron sputtering environment with direct current and single magnetron pattern.
采用扫描电子显微镜、表面粗糙度测试仪及X射线衍射仪分析了直流、单靶磁控溅射条件下磁控管非平衡度对Cr镀层生长过程的影响。
2.
SEM,surface roughness tester and XRD were used to analyze the influence of unbalanced coefficient of magnetron and closed-state of magnertic field on microstructure,surface roughness and preferred orientation of the Cr coatings.
利用非平衡磁控溅射离子镀技术于不同磁控管非平衡度和磁场闭合状态下在单晶硅基体上制备出Cr镀层,采用扫描电子显微镜、X射线衍射仪分析了不同生长阶段Cr镀层的微观形貌、表面粗糙度和晶体择优生长趋势的变化。
5)  Closed-field unbalanced magnetron sputtering
闭合场非平衡磁控溅射
1.
Closed-field unbalanced magnetron sputtering (CFUBMS) and 90° bend toroidal duct magnetic filtered cathodic vacuum arc (FCVA) were chosen to prepare DLC films for they are the better deposition technologies for industrial application, and the influences of deposition parameters on the structures and properties were investigated.
采用了闭合场非平衡磁控溅射和90°弯管磁过滤阴极弧两种适合产业化的技术,在单晶硅基体上沉积DLC膜,研究了工艺参数对DLC膜的结构和性能的影响。
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6)  degree of dis equilibrium
非平衡度
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补充资料：非想非非想处天
1.佛教语。即三界中无色界第四天。此天没有欲望与物质﹐仅有微妙的思想。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
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