1) engraves the wound machine
刻伤机
2) EDM sampling machine
电火花刻伤机
3) incising ,cut
刻伤
4) Wounds treatment
刻伤处理
5) etching damage
刻蚀损伤
1.
The advantage of SiO2 deposited by PECVD was reviewed and the influence of selection and ratio of the reaction gases on controlling of lateral etching was analyzed,and the etching damage was preliminarily analyzed as well.
主要研究了GaAlAs/GaAs多层结构波导的ICP(inductively coupled plasma)刻蚀,评述了使用PECVD制作的Si O2做掩膜的优点,分析了气体选择比对侧向钻蚀控制的影响,并初步分析了刻蚀损伤。
6) etch damage
刻蚀损伤
1.
The thickness of the etch damage layer is less than 25nm.
通过实验方法找出了去损伤刻蚀的最佳工艺参数,并研究了利用ICP两步刻蚀法去除刻蚀损伤的实验过程及结果。
补充资料：伤刻
1.谓过于刻薄。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条