1) copper deposit
![点击朗读](/dictall/images/read.gif)
铜沉积物
2) copper deposition
![点击朗读](/dictall/images/read.gif)
铜沉积
1.
Effect of impurity ions on microstructure of copper deposition;
![点击朗读](/dictall/images/read.gif)
杂质离子对铜沉积微观结构的影响
2.
Technology analysis and its countermeasure of copper deposition on turbine;
![点击朗读](/dictall/images/read.gif)
汽轮机铜沉积技术分析及解决方案
3.
The results obtained indicate that As 5+ ions increases the density of current exchanging of copper deposition reaction,and has an action of unpolarization on the process of copper deposition.
用线性电位扫描法研究了在准稳态条件下,As5+、Sb3+、Bi3+离子对酸性硫酸铜体系中阴极铜沉积反应动力学的影响。
3) electrodeposited copper
![点击朗读](/dictall/images/read.gif)
电沉积铜
1.
Time effect on resistivity and rigidity of electrodeposited copper;
![点击朗读](/dictall/images/read.gif)
电沉积铜的电阻率和硬度的时间效应
4) copper deposits
![点击朗读](/dictall/images/read.gif)
铜沉积层
5) sedimentary copper
![点击朗读](/dictall/images/read.gif)
沉积铜
1.
Cambrian in the southeastern sedimentary copper Jilin is considered to be the products of sedimentation and later reworking.
吉林东南部寒武纪沉积铜主要为沉积和后期热液改造综合作用的产物。
6) electrodepositing of copper
![点击朗读](/dictall/images/read.gif)
铜电沉积
1.
The As(Ⅲ) ion promotes the electrodepositing of copper.
![点击朗读](/dictall/images/read.gif)
采用循环伏安及交流阻抗研究As(Ⅲ,Ⅴ),Sb(Ⅲ,Ⅴ)和Bi(Ⅲ)对铜电沉积及阳极氧化机理的影响。
补充资料:乙酸铜一水合物 乙酸铜,一水
CAS:6046-93-1
分子式:C4H8CuO5
分子质量:199.65
中文名称:乙酸铜一水合物 乙酸铜,一水
英文名称:Acetic acid, copper salt, monohydrate;Copper acetate, monohydrate;Copper acetate monohydrate;Copper diacetate monohydrate;Cupric acetate monohydrate;Cupric acetate,monohydrate;copperacetate monohydrate;copperacetatemonohydrate
分子式:C4H8CuO5
分子质量:199.65
中文名称:乙酸铜一水合物 乙酸铜,一水
英文名称:Acetic acid, copper salt, monohydrate;Copper acetate, monohydrate;Copper acetate monohydrate;Copper diacetate monohydrate;Cupric acetate monohydrate;Cupric acetate,monohydrate;copperacetate monohydrate;copperacetatemonohydrate
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
参考词条