1) Frequency-doubled antireflection coating
二倍频增透膜
1.
1064 nm,532 nm frequency-doubled antireflection coatings with no buffer layer or with different buffer layers were fabricated on LBO crystal using electron beam evaporation technique.
采用电子束蒸发方法在LBO晶体上制备了无缓冲层和具有不同缓冲层的1064 nm,532 nm二倍频增透膜。
2.
1064 nm, 532 nm frequency-doubled antireflection coating was fabricated by using electron-beam evaporation on LiB3O5 (LBO).
采用电子束蒸发方法在三硼酸锂(LBO)晶体上制备了1064 nm,532 nm二倍频增透膜。
2) frequency-tripled antireflection coating
三倍频增透膜
3) Frequency-quadrupled antireflection coating
四倍频增透膜
4) ZrO_2/SiO_2 second harmonics anti-reflection films
ZrO2/SiO2非规整倍频增透膜
1.
Four layer,ZrO_2/SiO_2 second harmonics anti-reflection films,designed by means of Macload Software,were grown by e-beam evaporation and ion beam aided deposition on meta-barium borate(β-BaB_2O_4) β-BaB_2O_4 substrate,and then annealed in vacuum.
利用Macload软件对四层ZrO2/SiO2膜系进行优化设计,以β-偏硼酸钡晶体(-βBaB2O4)为基底,采用电子束蒸发方法、离子束辅助沉积技术和真空退火处理,制备出ZrO2/SiO2非规整倍频增透膜,其在波长532 nm和1064 nm处反射率小于0。
5) Silica AR coatings
二氧化硅增透膜
6) transmission secondary-emission multiplication
透射二次发射(电子)倍增
补充资料：增透膜
见光学薄膜。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条