2) multi-component nitride films
多元氮化物薄膜
1.
Effect of multi-component nitride films and their deposition process on the properties and microstructure of NiTi shape memory alloy substrate;
多元氮化物薄膜及其沉积工艺对Ni Ti记忆合金性能和组织的影响
3) oxynitride film
氮氧化合物薄膜
4) thin flim of metal carbon-nitrogen compound
金属碳氮化合物薄膜
5) silicon nitride film
氮化硅薄膜
1.
Microfabrication of silicon nitride film applied in microsensor;
微型传感器中氮化硅薄膜的微加工技术
2.
The structure and the property of amorphous silicon nitride film formed by direct current-plasma chemical vapour deposition (DC-PCVD) were analyzed.
对用直流等离子体化学气相沉积(DC—PCVD)法得到的非晶态氮化硅薄膜结构与性能进行了研究。
3.
0eV laser excitation, six luminescence emission bands of LPCVD silicon nitride film were observed corresponding to 2.
０ｅＶ的激光激发下，在室温下ＬＰＣＶＤ氮化硅薄膜可发射高强度可见荧光，其峰位位置分别为２。
6) ZrN thin film
氮化锆薄膜
1.
A chromatic prediction model was developed by artificial neural network through analyzing the relationship between the technological parameters for ZrN thin film preparation and relevant chromatic parameters.
建立了氮化锆薄膜制备工艺参数与薄膜色度参数之间的人工神经网络预测模型,结果表明,预测结果与实测结果吻合,最大色差在5。
补充资料：2,4,6-三异丙基苯磺酰叠氮化物
分子式：C15H23N3O2S
分子量：309.43
CAS号：63982-84-0
性质：
分子量：309.43
CAS号：63982-84-0
性质：
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条