1) radiofrequency glow discharge
射频辉光
1.
Preliminary spatial resolved studies of plasma in radiofrequency glow discharge optical emission spectroscopy for direct analysis of solid samples
应用于固体样品直接分析的射频辉光光谱中等离子体空间解析的初步研究
2) Radio frequency glow discharge
射频辉光放电
1.
The deposition of diamond-like carbon films produced by radio frequency glow discharge of hydrocarbon gas was studied,and the effects of radio frequency voltage and deposition time on the thickness and the Vickers microhardness of films were investigated.
研究了碳氢气体通过射频辉光放电沉积类金刚石碳膜。
2.
Plasma chemical vapor deposition in silane radio frequency glow discharge is a main fabrication technology of hydrogenated amorphous silicon(a-Si:H)films.
射频辉光放电硅烷等离子体化学汽相沉积是制备氢化非晶硅薄膜的主要工艺技术。
3.
This paper reports that a heated and tuned Langmuir probe has been used on the measurement of the electron energy distribution function f(E), the mean electron energy and the electron concentration in radio frequency glow discharge plasma, and gives a systemic analysis about the effect of the technology parameters on the electron character in plasma space.
本文采用加热的调谐单探针研究了射频辉光放电等离子体空间电子能量分布函数,电子平均能量和电子密度,并系统地分析了各工艺参量对于等离子体空间电子特性的影响。
3) RF glow discharge
射频辉光放电
1.
Optical emissiom spectra of SiH 4 rf glow discharge were measured by OMA-4000.
采用OMA - 4 0 0 0测量了SiH4射频辉光放电等离子体的光发射谱 ,研究了其谱线强度随放电射频功率和反应气体流量间的变化关系。
4) RF glow-discharge method
射频辉光放电法
1.
c-Si∶H/a-Si∶H multilayers have been prepared with RF glow-discharge method in which two types of coupling electrodes are alternately changed periodically.
利用射频辉光放电法 ,通过周期性交替切换两种耦合电极的方式 ,制备了 μc- Si∶ H/a- Si∶ H多层膜 。
5) RF PCVD
射频辉光化学气相沉积
6) glory scattering
辉光散射
补充资料：射频
射频
物理学术语。介于声波和红外线之间的波的频率。用于MR研究的射频常在兆赫兹(MHz)范围内。磁共振成像中，必须使用射频脉冲选择性激励特定层面的质子，以产生MR信号。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条