1.
Investigation on Nanocrystalline Fe-N Thin Films Grown by Direct Current Magnetron Sputtering;
直流磁控溅射纳米晶Fe-N薄膜的研究
2.
Research of ZnO Photoelectric Films by DC Magnetic Control Sputtering;
直流磁控溅射制备ZnO光电薄膜的研究
3.
Research of TiO_2 thin films prepared by DC magnetron sputtering
直流磁控溅射法制备TiO_2薄膜的研究
4.
The Microstrains Study of Au Films Prepared by DC Magnetron Sputtering
直流磁控溅射Au膜的微观应变研究
5.
Study on Nano TiO_2 Films Deposited by DC Magnetron Sputtering
直流磁控溅射制备纳米TiO_2薄膜研究
6.
Study of Preparation and Texture Property by DC Magetron Sputter TiNiCu Thin Films;
直流磁控溅射TiNiCu薄膜的制备与组织性能研究
7.
Study on Gas Sensing Properties of SnO_2 Thin Films Deposited by DC Reactive Magnetron Sputtering;
直流磁控溅射法制备SnO_2薄膜及其气敏特性研究
8.
The Properties of Copper Thin Films Prepared by Roll to Roll Processing and DC Magnetron Sputtering Methods
卷绕直流磁控溅射法制备铜膜及其性能研究
9.
Preparation and Properties of Titanium-doped Zinc Oxide Films by DC Magnetron Sputtering
直流磁控溅射法制备掺钛氧化锌透明导电薄膜
10.
Effect of Process Parameters on the Deposition of DC Magnetron Sputtered Films
工艺参数对直流磁控溅射膜沉积的影响
11.
HIGH QUALITY SINGLE-PHASE β-FeSi_2 THIN FILMS PREPARED BY DC-MAGNETRON SPUTTERING
直流磁控溅射法制备单一相高质量β-FeSi_2薄膜
12.
Influence of operating parameters on discharge characteristics of planar DC magnetron
工作参数对平面直流磁控溅射放电特性的影响
13.
Structure and Properties of Chromium Films Deposited by D.C Magnetron Sputtering on Zircaloy Substrate;
锆合金基体上直流磁控溅射铬膜组织与性能研究
14.
Preparation of Transparent Conducting Tin-Antimony Oxide Thin Films by DC Magnetron Sputtering;
直流磁控溅射法制备Sn-Sb系透明导电氧化物薄膜
15.
Growth and Properties of Transparent Conducting ZnO:Ti Films by DC Magnetron Sputtering at Low Temperature
直流磁控溅射法低温制备ZnO:Ti透明导电薄膜及特性研究
16.
PIC/MCC Simulation of Planar DC Magnetron Sputtering;
PIC/MCC模拟直流平面磁控溅射
17.
Deposition of p Type ZnMgO Thin Films by DC Reactive Magnetron Sputtering;
直流反应磁控溅射法制备p型ZnMgO薄膜
18.
Preparation and Properties of Transparent and Conductive ZnO: Ga Film by DC Magnetron Reactive Sputtering;
直流磁控反应溅射制备ZnO：Ga薄膜及其性能研究