1.
Preparation of NiO thin films by DC sputtering and structure characterization
直流溅射沉积氧化镍薄膜及结构表征
2.
Effect of Film Thickness on Properties of AZO Films Prepared by DC Magnetron Sputtering
薄膜厚度对直流溅射制备AZO薄膜的特性影响
3.
Investigation on Nanocrystalline Fe-N Thin Films Grown by Direct Current Magnetron Sputtering;
直流磁控溅射纳米晶Fe-N薄膜的研究
4.
PIC/MCC Simulation of Planar DC Magnetron Sputtering;
PIC/MCC模拟直流平面磁控溅射
5.
Deposition of p Type ZnMgO Thin Films by DC Reactive Magnetron Sputtering;
直流反应磁控溅射法制备p型ZnMgO薄膜
6.
Research of ZnO Photoelectric Films by DC Magnetic Control Sputtering;
直流磁控溅射制备ZnO光电薄膜的研究
7.
Research of TiO_2 thin films prepared by DC magnetron sputtering
直流磁控溅射法制备TiO_2薄膜的研究
8.
The Microstrains Study of Au Films Prepared by DC Magnetron Sputtering
直流磁控溅射Au膜的微观应变研究
9.
Study on Nano TiO_2 Films Deposited by DC Magnetron Sputtering
直流磁控溅射制备纳米TiO_2薄膜研究
10.
Preparation and Properties of Transparent and Conductive ZnO: Ga Film by DC Magnetron Reactive Sputtering;
直流磁控反应溅射制备ZnO：Ga薄膜及其性能研究
11.
Na-doped p-type ZnO Thin Films Prepared by DC Reactive Magnetron Sputtering;
直流反应磁控溅射法制备Na掺杂p型ZnO薄膜
12.
Preparation of p-Type ZnMgO Thin Films Using Ga-N Codoping Method by Reactive Magnetron Sputtering;
直流反应磁控溅射法制备Ga-N共掺p型ZnMgO薄膜
13.
Study of Preparation and Texture Property by DC Magetron Sputter TiNiCu Thin Films;
直流磁控溅射TiNiCu薄膜的制备与组织性能研究
14.
Study on Gas Sensing Properties of SnO_2 Thin Films Deposited by DC Reactive Magnetron Sputtering;
直流磁控溅射法制备SnO_2薄膜及其气敏特性研究
15.
Preparation of TiO_2 Thin Films by DC Magnetron Reaction Sputtering and Study on Oxygen-Sensing Properties;
直流磁控反应溅射制备TiO_2薄膜及氧敏特性研究
16.
The Properties of Copper Thin Films Prepared by Roll to Roll Processing and DC Magnetron Sputtering Methods
卷绕直流磁控溅射法制备铜膜及其性能研究
17.
Preparation and Properties of Titanium-doped Zinc Oxide Films by DC Magnetron Sputtering
直流磁控溅射法制备掺钛氧化锌透明导电薄膜
18.
Effect of Process Parameters on the Deposition of DC Magnetron Sputtered Films
工艺参数对直流磁控溅射膜沉积的影响