1.
Fabrication of Silicon Inverse Opal Three-Dimensional Photonic Crystal Using Lpcvd/Template Techniques;
低压化学气相沉积/模板技术制备硅反蛋白石三维光子晶体
2.
Synthesis of Carbon Nanotubes by Low Pressure Chemical Vapor Deposition and Their Applications
碳纳米管的低压化学气相沉积法制备及其应用研究
3.
Fabrication of Germanium Inverse Opal Three-dimensional Photonic Crystal by LPCVD
低压化学气相沉积技术制备锗反蛋白石三维光子晶体
4.
The Study of the Deposition of SiO_2 Films with RF Cold Plasma at Atmospheric-pressure;
常压射频低温等离子体增强化学气相沉积二氧化硅薄膜的研究
5.
The Effect of Bias on Low Pressure Plasma-Enhanced Chemical Vapour Deposition of TiO_2 Film and its Structure and Performance
偏压对低气压等离子体增强化学气相沉积TiO_2薄膜的结构和性能的影响
6.
thermally activated chemical vapour deposition
热活化化学气相沉积
7.
plasma activated chemical vapour deposition
等离子体化学气相沉积
8.
epitaxial CVD growth
外延化学气相沉积生长
9.
A Study on Atmospheric Pressure Chemical Vapor Deposition of TiN Film and Its Kinetics;
TiN薄膜常压化学气相沉积及动力学研究
10.
Low Temperature Synthesis of Nano Onion-like Fullerenes by CVD
化学气相沉积法低温合成纳米洋葱状富勒烯
11.
A Ti_5Si_3 THIN FILM AND ITS COATING GLASS DEPOSITED BY ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION METHOD
常压化学气相沉积法制备Ti_5Si_3薄膜及其镀膜玻璃
12.
Atmospheric-pressure Plasma Chemical Vapor Deposition for Polycrystalline Silicon Preparation from SiCl_4 and OES Diagnosis
由SiCl_4制备多晶硅的大气压等离子体化学气相沉积及发射光谱诊断
13.
Preparation of TiO_2 Films by Atmospheric Pressure Chemical Vapor Deposition & Study of Doping Properties;
常压化学气相沉积法二氧化钛薄膜的制备与掺杂性能研究
14.
The Study of Diamond Films and Its Composite Films Deposited by Bias Voltage HFCVD;
偏压热丝化学气相沉积金刚石膜及其复合膜的研究
15.
Study of Porous Nanocrystalline TiO_2 Thin Film Deposited by Atmospheric Pressure Plasma-enhanced Chemical Vapor Deposition;
常压等离子化学气相沉积纳米晶TiO_2多孔薄膜的研究
16.
Preparation of self-cleaning glass coated with TiO_2 on a float glass line by APCVD method
在线常压化学气相沉积方法制备TiO_2自洁薄膜玻璃(英文)
17.
Effect of Oxygen Partial Pressure on the Morphology of ZnO Nanostructure Prepared by Chemical Vapor Deposition
氧分压对化学气相沉积法合成ZnO纳米结构形貌的影响
18.
Study of Porous Nanocrystalline TiO_2 Thin Film Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapour Deposition
常压等离子体增强化学气相沉积纳米晶TiO_2多孔薄膜的研究