1.
The Research on TiN Films Deposited by Magnetron Sputtering;
反应磁控溅射法制备TiN薄膜的研究
2.
Study on the Tribological Properties of TiN Thin Films with Different Thicknesses
不同厚度TiN薄膜摩擦学性能研究
3.
The influence of TiN thin flms grown processing by magnetron sputtering
磁控溅射制备TiN薄膜影响因素的研究
4.
Research on Mo+C Implantation into TiN Film by Multi-arc Ion Plating
Mo+C离子注入多弧离子镀TiN薄膜研究
5.
Study of MOCVD TiN in Advanced Semiconductor Manufacturing;
MOCVD TiN薄膜在先进集成电路制造中应用的研究
6.
Preparation and Characteristic of TiN Film Prepared by Arc Ion Plating;
电弧离子镀TiN薄膜的制备及其特性研究
7.
Optical Property of TiN Films Deposited by Magnetron Sputtering;
TiN薄膜的磁控溅射法制备及其光学性能研究
8.
A Study on Atmospheric Pressure Chemical Vapor Deposition of TiN Film and Its Kinetics;
TiN薄膜常压化学气相沉积及动力学研究
9.
Preparation and properties of TiN films on ZL109 aluminum alloy by multi-arc ion plating
ZL109铝合金表面多弧离子镀TiN薄膜的制备及性能
10.
Tribological properties of TiN films under different testing conditions
不同测试条件下TiN薄膜的摩擦学特性研究
11.
Research Progress of Preparation Technology,Properties and Application Development of TiN Thin Film
TiN薄膜制备方法、性能及其应用的研究进展
12.
Technological parameters and electrical property of TiN thin films grown processing by magnetron sputtering
磁控溅射TiN薄膜的工艺及电学性能研究
13.
Visible Light Photoelectrochemical Response of Nitrogen-Doped TiO_2 Thin Films Prepared by Anodic Oxidation of Titanium Nitride Films
阳极氧化TiN薄膜制备N掺杂纳米TiO_2薄膜及其可见光活性
14.
Electrical Characteristics and TiN Film Deposition of Plasma Assisted Magnetron Sputtering;
外部等离子源辅助磁控溅射电特性及TiN薄膜制备研究
15.
Surface morphology and properties of the hollow cathode ion-plating and multi-arc ion plated TiN film
空心阴极与多弧离子镀TiN薄膜的表面形貌及性能
16.
Scratching Test and Its Finite Element Simulation for Estimating Adhesion between TiN Film and Substrate
评估TiN薄膜与基材结合的划痕试验及有限元模拟
17.
Fabrication Process and Application of TiN-TiN/CrN-CrN Films
TiN-TiN/CrN-CrN薄膜的制备及应用研究
18.
Study on Properties of TiN and ZrN Films Deposited by Magnetron Sputtering;
磁控溅射TiN及ZrN薄膜的特性研究