1.
Electroluminescence from a Mn~(2+) Activated SiO_2:Si Film on n~+-Si Substrate
硅基掺锰富硅氧化硅薄膜的电致发光
2.
Fabrication of P-type Amorphous Silicon Thin Films and Poly-Silicom by PECVD;
PECVD法制备P型非晶硅薄膜及多晶硅薄膜
3.
Preparation of Poly-Silicon Thin Film in Low Temperature Using SiH_4 as Gas Source by ECR-PECVD;
以硅烷为气源用ECR-PECVD制备多晶硅薄膜
4.
Research in Growth of Poly-Si_(1-x)Ge_x on SiO_2 by UHVCVD;
利用UHV/CVD在SiO_2薄膜上生长多晶锗硅薄膜的研究
5.
The application of ZnO:Ga thin film to amorphous silicon thin film solar cells on polymer substrate
柔性衬底硅薄膜太阳电池中ZGO薄膜的应用
6.
Si rich SiO2 films have been prepared by a rf magnetron sputter method.
用射频磁控溅射法制备了富硅二氧化硅薄膜。
7.
Preparation of Polycrystalline Silicon Film on Upgraded Metallurgical Silicon Substrate by ECR-PECVD;
在升级冶金级硅衬底上用ECR-PECVD沉积多晶硅薄膜
8.
Studies on Preparing Poly-Si Thin Film on Ssp Substrate at Low-temperature;
以硅带为衬底低温制备多晶硅薄膜的研究
9.
Epitaxial Growth of Cubic Silicon Carbide on Silicon by Sublimation Method;
用升华法在硅衬底上外延生长β碳化硅薄膜
10.
Preparation of Thin SiO_2 Films from Polysilane Coatings Using Oxygen Plasma Method;
氧等离子体处理聚硅烷涂层制备二氧化硅薄膜
11.
Preparation of Silicon-based Silicon Nitride Films by PECVD and Research on the Wearing Properties
PECVD法硅基氮化硅薄膜的制备及其耐磨性研究
12.
Effect of N_2O Plasma Treatment on Luminescence of Silicon-rich Silicon Nitride Films
N_2O等离子体处理对富硅氮化硅薄膜发光的影响
13.
Annealing Behavior of Silicon Nitride Thin Film Deposited by PECVD;
PECVD沉积的氮化硅薄膜热处理性质研究
14.
Research on Microstructure and Properties of Silicon Films on Glass Substrates;
玻璃基板上硅薄膜结构和性能的研究
15.
The Study of Growth of SiGe Thin Films and Electrical Properties by UHVCVD;
UHVCVD生长锗硅薄膜及其电学性能研究
16.
Synthesis of Ordered Mesoporous Silica Films Using Molecular Templating Method;
分子模板法制备有序介孔氧化硅薄膜
17.
The Preparation of Device-Quality Hydrogenated Amorphous Silicon Thin Films by Mwecr-Cvd Assisted by Hot-Wire;
热丝辅助MWECR-CVD制备器件级非晶硅薄膜
18.
Structure Analysis of Polycrystalline Silicon Films Prepared by ECR-PECVD at Low Temperature;
多晶硅薄膜ECR-PECVD低温生长结构研究