1.
Gas sensing characteristics of SnO_(2-x) films deposited by RF reaction sputtering
射频反应溅射法制备SnO_(2-x)纳米薄膜的气敏特性研究
2.
Study on HfO_2 Thin Film by RF Magnetron Reactive Sputtering;
射频磁控反应溅射法制备HfO_2薄膜的研究
3.
Study on Y_2O_3 Thin Film by RF Magnetron Reactive Sputtering;
射频磁控反应溅射法制备Y_2O_3薄膜的研究
4.
The Study of Reactive Frequency Sputtering Prepared Electrochromic NiO_x Films;
反应性射频溅射制备电致变色NiO_x薄膜的研究
5.
Preparation and Field Emission Properties of Copper Nitride Films by Reactive Radio-frequency Magnetron Sputtering
射频反应磁控溅射制备氮化铜纳米薄膜及其场发射性能研究
6.
The Study on the Microstructure and Properties of Al_2O_3 Thin Films Prepared by Radio Frequency Reactive Magnetron Sputtering;
射频反应磁控溅射法制备Al_2O_3薄膜结构与性能的研究
7.
Study on Band-gap Engineering of ZnO Films Made by Reactive Radio-Frequency Magnetron Sputtering;
射频反应磁控溅射ZnO薄膜能带工程相关问题研究
8.
Preparation and Characterization of Copper Nitride Films by Reactive Radio-frequency Magnetron Sputtering;
射频反应磁控溅射制备氮化铜（Cu_3N）薄膜及其性能研究
9.
Research on the Microstructure and Electric Breakdown Strength of Silicon Oxide Thin Film Deposited by RF Magnetron Reactive Sputtering
射频磁控反应溅射氧化硅薄膜微结构和电击穿场强研究
10.
Radio Frequency Magnetron Sputtering SnO_2 Doped MWCNTs Thin Film
射频反应磁控溅射SnO_2/MWCNTs薄膜材料的气敏性能研究
11.
Preparation of SiO_2 ion barrier film with RF magnetron sputtering
射频磁控溅射制备SiO_2防离子反馈膜工艺探讨
12.
The Craft Study on Color of ZrN Decorative Coating by Mid-Frequency Reactive Magnetron Sputtering;
中频反应磁控溅射制备氮化锆薄膜及颜色制备工艺参数研究
13.
The Craft Study on ZrN Decorative Coatings by Medium-Frequency Reactive Magnetron Sputtering Technique;
装饰薄膜氮化锆的中频反应磁控溅射沉积工艺的研究
14.
A Study on the Preparation of Tantalum Oxide Films by Mid-Frequency AC Reactive Sputtering and Their Dielectric Properties;
中频交流反应溅射氧化钽薄膜制备及介电性能研究
15.
Blue Photoluminescence from Cerium Ions Doped Aluminum Oxide Films by Medium Frequency Reactive Magnetron Sputtering
中频反应磁控溅射制备Al_2O_3:Ce~(3+)薄膜的蓝色发光特性(英文)
16.
Photoluminescence of Al_2O_3:CeCl_3 Films by Medium Frequency Reactive Magnetron Sputtering
中频反应磁控溅射制备Al_2O_3:CeCl_3薄膜及其光致发光特性
17.
Effect of doped Ce~(3+) concentration on luminescent properties of Al_2O_3:Ce~(3+) films deposited by medium-frequency reaction magnetron sputtering
掺杂浓度对中频反应磁控溅射制备Al_2O_3:Ce~(3+)薄膜发光性能的影响
18.
Plasma Emission Monitoring and TiO_2 Films Growth by Mid-Frequency Dual Magnetron Reactive Sputtering
等离子体发射监控系统参与的中频孪生反应磁控溅射沉积TiO_2薄膜的实验研究