1.
Study on Preparation of Vanadium Oxide Thin Films on Different Substrates Using Facing Targets DC Reactive Sputtering Technique;
利用对靶磁控溅射在不同衬底上制备氧化钒薄膜的研究
2.
Phase Transition Vanadium Oxide Thin Films Fabricated by Facing Targets Magnetron Sputtering with Low Temperature Thermal Oxidation
用对靶磁控溅射附加低温热氧化处理方法制备相变氧化钒薄膜
3.
Magnetic Properties and Microstructure of Sandwiched Transition Metal Nanofilms Deposited by Facing-Target Magnetron Sputtering
对靶磁控溅射法沉积类三明治结构过渡金属纳米薄膜的磁特性和微结构研究
4.
Thermal Oxidation Annealing on Nanovanadium Oxide Thin Film Deposited by Direct Current Facing Targets Magnetron Sputtering
对向靶磁控溅射纳米氧化钒薄膜的热氧化处理
5.
Preparation and Properties of Smco/cr Films by RF magnetron Sputtering More Target Together;
多靶射频磁控共溅射SmCo/Cr薄膜的制备和磁性能
6.
Effect of Target Current on Structure and Characteristics of the Hydrogen-free Carbon Films by Unbalanced Magnetron Sputtering
靶电流对非平衡磁控溅射制备无氢碳膜结构与性能的影响
7.
Properties of Aluminum Nitride Thin Films Grown by Radio Frequency Magnetron Sputtering Using AlN Target
AlN靶材射频磁控溅射制备AlN薄膜及性质研究
8.
Simulation Study of the Sputtering Yield and the Target Erosion on the Magnetron Sputtering Process;
磁控溅射过程中溅射产额及靶材刻蚀的模拟计算研究
9.
Application of Self organizing Fuzzy Control Based on the Single Chip Microcomputer on the SCR Magnetic Sputter Cathodic Power Source
单片机及自组织模糊控制在可控硅磁控溅射靶极电源中的应用
10.
THE BREAKDOWN FIELD OF SILICON OXIDE THIN FILM DEPOSITED BY RF-REACTIVE MAGNETRON SPUTTERING ON LOW TEMPERATURE
硅靶低温射频磁控溅射沉积氧化硅薄膜的电击穿场强
11.
The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。
12.
Preparation of Sputtering Targets and Thin Film Structure Characterization of La and Ca-Doped PbTiO_3;
La和Ca掺杂PbTiO_3磁控溅射靶材制备及薄膜结构表征
13.
Preparation and Properties of TiAlN Thin Films by Dual-target D.C. Reactive Magnetron Co-sputtering
双靶直流反应磁控共溅射沉积TiAlN薄膜及其性能研究
14.
Study on movement of charged particles and etched profile on target surface during magnetron sputtering
磁控溅射带电粒子的运动分布以及靶面刻蚀形貌的研究
15.
Influence of substrate structure on electromagnetic shielding effectiveness of copper film prepared by magnetron sputtering
基底结构对磁控溅射铜膜电磁屏蔽效能的影响
16.
Effect of Ratio of gas Flowrate on Al_2O_3 Thin Films Prepared by Reactive Magnetron Sputtering
气体流量控制对磁控溅射Al_2O_3薄膜的影响
17.
Effect of Carbon Content on Properties of Magnetron Sputtered Cr/C Coatings;
碳含量对磁控溅射Cr/C镀层性能的影响
18.
Effect of sputtering parameters on texture of Cu films
磁控溅射工艺参数对Cu薄膜织构的影响