1.
Research of TiO_2 thin films prepared by DC magnetron sputtering
直流磁控溅射法制备TiO_2薄膜的研究
2.
Study on Gas Sensing Properties of SnO_2 Thin Films Deposited by DC Reactive Magnetron Sputtering;
直流磁控溅射法制备SnO_2薄膜及其气敏特性研究
3.
The Properties of Copper Thin Films Prepared by Roll to Roll Processing and DC Magnetron Sputtering Methods
卷绕直流磁控溅射法制备铜膜及其性能研究
4.
Preparation and Properties of Titanium-doped Zinc Oxide Films by DC Magnetron Sputtering
直流磁控溅射法制备掺钛氧化锌透明导电薄膜
5.
HIGH QUALITY SINGLE-PHASE β-FeSi_2 THIN FILMS PREPARED BY DC-MAGNETRON SPUTTERING
直流磁控溅射法制备单一相高质量β-FeSi_2薄膜
6.
Preparation of Transparent Conducting Tin-Antimony Oxide Thin Films by DC Magnetron Sputtering;
直流磁控溅射法制备Sn-Sb系透明导电氧化物薄膜
7.
Growth and Properties of Transparent Conducting ZnO:Ti Films by DC Magnetron Sputtering at Low Temperature
直流磁控溅射法低温制备ZnO:Ti透明导电薄膜及特性研究
8.
A Novel Transparent Conducting ZnO:Zr Films Deposited on ZnO-buffered Flexible Substrates by DC Magnetron Sputtering
利用直流磁控溅射法在柔性衬底上制备ZnO:Zr新型透明导电薄膜(英文)
9.
Preparation and Characterization of Transparent Conducting Films ZnO∶Zr Deposited by DC Magnetron Sputtering
直流磁控溅射法制备ZnO∶Zr透明导电薄膜及性能研究
10.
Deposition of p Type ZnMgO Thin Films by DC Reactive Magnetron Sputtering;
直流反应磁控溅射法制备p型ZnMgO薄膜
11.
Na-doped p-type ZnO Thin Films Prepared by DC Reactive Magnetron Sputtering;
直流反应磁控溅射法制备Na掺杂p型ZnO薄膜
12.
Preparation of p-Type ZnMgO Thin Films Using Ga-N Codoping Method by Reactive Magnetron Sputtering;
直流反应磁控溅射法制备Ga-N共掺p型ZnMgO薄膜
13.
Investigation on Nanocrystalline Fe-N Thin Films Grown by Direct Current Magnetron Sputtering;
直流磁控溅射纳米晶Fe-N薄膜的研究
14.
PIC/MCC Simulation of Planar DC Magnetron Sputtering;
PIC/MCC模拟直流平面磁控溅射
15.
Research of ZnO Photoelectric Films by DC Magnetic Control Sputtering;
直流磁控溅射制备ZnO光电薄膜的研究
16.
The Microstrains Study of Au Films Prepared by DC Magnetron Sputtering
直流磁控溅射Au膜的微观应变研究
17.
Study on Nano TiO_2 Films Deposited by DC Magnetron Sputtering
直流磁控溅射制备纳米TiO_2薄膜研究
18.
Structure and Properties of Hydrogenated Amorphous Silicon Thin Films by R.F and D.C Magnetron Sputtering
氢化非晶硅薄膜的直流和射频磁控溅射法制备及其表征