1.
Effect of sputtering technology on magneto-optical properties of GdTbFeCo thin films
溅射工艺对GdTbFeCo薄膜磁光性能的影响
2.
Growth of Indium Tin Oxides Films by Magnetron Sputtering
ITO薄膜的磁控溅射工艺优化研究
3.
Effect of Radio Frequency Sputtering Technology on Frictional Behavior of WS_x Thin Film
射频溅射工艺对WS_x薄膜摩擦性能的影响
4.
Effect of sputtering parameters on texture of Cu films
磁控溅射工艺参数对Cu薄膜织构的影响
5.
Deposition of Al Oxide-Doped ZnO Films on Substrates of Polythylene Terephthalate Nonwovens
PET纤维基AZO透明导电薄膜溅射工艺参数的优化
6.
Influences of Sputtering Conditions on Preparation of VO_x Thin Film and Its Ohmic Contact to Metal Electrode
溅射工艺条件对氧化钒欧姆接触特性的影响
7.
Influence of Technological Parameters on Binding Ability of Stainless Steel Film by Magnetron Sputtering
磁控溅射工艺参数对不锈钢薄膜结合性能的影响
8.
Study on the Process and Properties of ZAO Film Prepared by Magnetron Sputtering at Low Temperature
低温磁控溅射ZAO薄膜工艺及性能研究
9.
Preparation of SiO_2 ion barrier film with RF magnetron sputtering
射频磁控溅射制备SiO_2防离子反馈膜工艺探讨
10.
PROCESS PARAMETERS DETERMINATION OF ETCHING LITHOGRAPHY SERVO DISK BY HF SPUTTERING
利用高频溅射刻蚀光刻伺服盘工艺参数的确定
11.
Studies in the Technologies for the a-C:H Films Prepared by Middle Frequency Unbalanced Magnetron Sputtering;
中频非平衡磁控溅射制备DLC膜的工艺研究
12.
Preparation of Doped Ceria Solid Electrolyte Thin Film by Magnetron Sputtering;
掺杂CeO_2电解质薄膜的磁控溅射制备工艺探索
13.
Preparation Technology and Properties of Magnetron Sputtering SiO_2 Based LaB_6 Films
磁控溅射SiO_2基LaB_6薄膜的制备工艺及性能
14.
Study of the Preparation and the Structures of Si:H Films Deposited by RF Magnetron Sputtering
硅氢薄膜RF磁控溅射法制备工艺及结构研究
15.
Preparation of Quartz Resonators with Pulse Magnetron Sputtering Technology
脉冲溅射技术制备石英谐振器的工艺研究(英文)
16.
Research of the Vacuum Magnetron Sputtering Deposition Equipment and its Prdcess
真空磁控溅射镀膜设备及工艺技术研究
17.
Effect of Process Parameters on the Deposition of DC Magnetron Sputtered Films
工艺参数对直流磁控溅射膜沉积的影响
18.
Growth Process of Preferential Orientation of AlN Thin Films by Magnetron Reactive Sputtering
磁控溅射氮化铝薄膜取向生长工艺研究