1.
Molecular deposition film drive is a new nanometer film drive technology.
分子沉积膜驱是一种新型的纳米膜驱油技术。
2.
Experiment on Efficiency of Molecular Deposition Film Flooding and Analysis on the Influence Factors
分子沉积膜驱油效率实验及影响因素分析
3.
Research of the compatibility and oil displacement result of molecular deposition membrane agent and polymer
分子沉积膜剂与聚合物配伍性研究及驱油效果评价
4.
Chemical Vapor-deposited Copper Thin Films on Self-assembled Monolayers;
自组装单分子层上化学气相沉积铜薄膜研究
5.
Preferred Orientation of Vapor-deposited Thin Films and Valence Electron Structure Analysis;
气相沉积薄膜的择优取向及其价电子结构分析
6.
Analysis of Optical Constant in Near Infrared Region of TiO_2 Thin Film Deposited by Ion Beam Assisted Deposition
离子束辅助沉积TiO_2薄膜近红外光学特性分析
7.
NiHCF film electrodes prepared by pulsed electrodeposition for electrochemically controlled ion separation
脉冲电沉积制备电控离子分离NiHCF膜电极
8.
Polymer Assisted Deposition of oxide and nitride films
高分子辅助沉积法制备氧化物和氮化物薄膜
9.
Deposition process of MgO thin film on MgO(001) surface simulated by molecular dynamics
MgO(001)表面上沉积MgO薄膜过程的分子动力学模拟
10.
Effects of Organic Functional Groups of Self-assembled Monolayers on Chemical Vapor-deposited Copper Films;
自组装单分子膜的末端功能基团对化学气相沉积铜薄膜的影响
11.
TEM Study on Diamond Films Deposited by MPCVD;
微波等离子体化学气相沉积金刚石薄膜的电子显微学分析
12.
Research on Preparation and Nanotribological Behavior of CuS Nanoparticle and Molecular Deposition Film
CuS纳米粒子/分子沉积膜的制备及其摩擦学性能研究
13.
Synthesis and Characterization of In-situ Growth CuS Nanoparticles in Polyelectrolyte Molecular Deposition Films
聚电解质原位生长CuS纳米粒子分子沉积膜的制备及表征
14.
ANALYSIS OF THE MORPHOLOGIES OF DIAMOND FILM GROWN BY MICROWAVE PLASMA CVD METHOD
微波等离子体化学气相沉积金刚石薄膜形貌分析
15.
Preparation、Characterization and Applications of Electrodeposited NiHCF Films on Graphite Substrate for ECIS;
电沉积石墨基体NiHCF电控离子分离膜电极的制备、表征及应用
16.
Molecular Dynamics Simulation of the Extension of Nano Wire and the Growth of Nano Thin Film;
纳米丝拉伸及纳米薄膜沉积过程的分子动力学模拟
17.
Preparation of BCN thin films by ion beam assisted pulsed laser deposition
离子束辅助脉冲激光沉积硼碳氮薄膜
18.
Ultra-thin C-N-Si Protective Films Prepared by Plasma Enhanced Deposition;
等离子体增强沉积C-N-Si超薄保护膜