1.
Computer Simulation of Thin Film Deposition by RF Magnetron Sputtering;
射频磁控溅射沉积薄膜的计算机模拟
2.
Study of MoS_2-Ti Composite Coatings Deposited by Unbalanced Magnetron Sputtering;
非平衡磁控溅射沉积MoS_2-Ti复合薄膜研究
3.
Study on SiO_x Coating Deposition by Magnetron Sputtering with Ion Beam Assisted;
离子源辅助磁控溅射沉积SiO_x阻隔薄膜的研究
4.
Improvement of CdO Thin Films Deposited by DC Magnetron Sputtering;
磁控溅射法沉积透明导电CdO薄膜的性能优化
5.
Characterization and Texture of Magnetron Sputtered Ag Thin Films After Annealing;
磁控溅射沉积银薄膜退火织构及其表征
6.
Preparation of Uranium Film by Ultra High Vacuum Magnetron Sputtering and Its Characterization
超高真空磁控溅射法沉积铀薄膜及其表面状态
7.
Growth and Mechanical Properties of Stainless Steel Thin Films Prepared by DC Magnetron Sputtering on Al Alloy Foil
铝表面磁控溅射沉积不锈钢薄膜及其性能
8.
Research on Photoelectric Characteristics of ITO Film Prepared by DC Magnetron Sputtering at low Temperature
磁控溅射低温沉积ITO薄膜及其光电特性研究
9.
Influence of Deposition Power of the Diamond-like Carbon Films Prepared by Medium Frequency Reactive Deposition
中频磁控溅射制备a-C∶H薄膜中沉积功率的影响
10.
Study of deposition and properties of aluminum nitride thin films by mediate frequency pulsed magnetron sputtering
中频脉冲磁控溅射沉积氮化铝薄膜及性能研究
11.
Discharge Properties of Unbalanced Magnetron Sputtering System and Application of TiN_x Films Deposition;
非平衡磁控溅射沉积系统放电特性和沉积TiN_x薄膜应用研究
12.
Effects of deposition parameters on deposition rate of B-C-N film prepared by magnetron sputtering
磁控溅射沉积参数对硼碳氮薄膜沉积速率的影响
13.
Deposition of ZnO Films by Radio-frequency Magnetron Sputtering on Freestanding Thick Diamond Films;
自持金刚石厚膜上磁控溅射法沉积ZnO薄膜的研究
14.
THE BREAKDOWN FIELD OF SILICON OXIDE THIN FILM DEPOSITED BY RF-REACTIVE MAGNETRON SPUTTERING ON LOW TEMPERATURE
硅靶低温射频磁控溅射沉积氧化硅薄膜的电击穿场强
15.
Growth of Silica Films on Polythylene Terephthalate Substrates by RF Magnetron Sputtering
缠绕式射频磁控溅射聚酯(PET)表面沉积氧化硅(SiO_x)薄膜的研究
16.
Copper films on flexible PI subtrate prepared by roll magnetron sputtering
卷绕式磁控溅射法沉积PI-Cu膜
17.
The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。
18.
Structure and Nano-Tribological Behavior of BCN Films Deposited by Magnetron Sputtering;
磁控溅射沉积BCN薄膜结构与纳米摩擦磨损行为研究