1.
Influences of deposition temperature and rate on mechanical stress of electron beam deposited ZnSe thin films
沉积温度和速率对电子束沉积ZnSe薄膜应力特性的影响
2.
High-mobility transparent conducting IMO thin films grown by reactive electron beam vapor deposition
电子束沉积生长高迁移率IMO透明导电薄膜的研究
3.
Electron Beam Vapor Deposited La_2Zr_2O_7 Thermal Barrier Coaings
电子束物理气相沉积La_2Zr_2O_7热障涂层研究
4.
Preparation of Patterned Media with Electron Beam Direct-Writing Lithography and Electrodeposition
电子束直写模版电沉积制备图案化磁记录介质
5.
Electron emission suppression characteristic of molybdenum grid coated with Hf by ion beam assisted deposition
离子束辅助沉积铪膜抑制栅电子发射性能研究
6.
Prepared TiN Thin Films by LTP Enhanced Electronic Beam Evaporation;
低温等离子体增强电子束蒸发沉积TiN的研究
7.
Study of Oxide Optical Films Deposited by Bias-Voltage E-Beam Evaportation;
偏压电子束蒸发沉积氧化物光学薄膜研究
8.
The Forming Character of Electron Beam Freeform Fabrication
电子束熔丝沉积快速制造的成型与组织特征
9.
Progress in EB-PVD Thermal Barrier Coatings
电子束物理气相沉积热障涂层技术研究进展
10.
Simulation study on energy deposition in layered target irradiated by electron beam
电子束辐照多层介质能量沉积规律的仿真研究
11.
The Study of High Tc Superconductor Films Deposited by Pulsed Electron Beam System
脉冲电子束系统沉积高温超导薄膜研究
12.
In the writing action the beam either does, or does not, deposit electrons according to a one or zero input.
在写操作时,根据输入是1还是0决定电子束是否沉积电子。
13.
The Arc Ion Plating Deposition of TiAlN Film Aided by Pulse N Ion Beam
脉冲N离子束辅助电弧离子镀沉积TiAlN膜层的研究
14.
EFFECT OF ION BEAM ASSISTED BOMBARDMENT ON TiAlN COATINGS DEPOSITED BY ARC ION PLATING
离子束辅助轰击对电弧离子镀沉积TiAlN膜层的影响
15.
Microstructure and Property Research on TiAl-Based Alloy Sheet Fabricated by EB-PVD;
电子束物理气相沉积制备TiAl基合金薄板的组织性能研究
16.
Effect of Substrate Temperature on Properties of Boron Carbide Thin Films Deposited by Electron Beam Evaporation
基片温度对电子束蒸发沉积碳化硼薄膜性能的影响
17.
Influence of Digging Effect on Films Thickness Uniformity for Electron Beam Evaporating onto Sphere Jig
挖坑效应对球形夹具下电子束蒸发沉积薄膜厚度均匀性的影响
18.
Microstructure of As-Deposited Ni-Cr-Al Alloy Thin Sheet by EBPVD
电子束物理气相沉积Ni-Cr-Al合金薄板微观组织研究