1.
Plasma Etching and Parameters Optimizing for Flexible PI Substrate to Produce Flying Lead
等离子蚀刻挠性PI基材制作悬空引线及其参数优化
2.
plasma sputter combined etching
等离子溅射复合刻蚀
3.
NUMERICAL STUDIES ON ETCH PROFILES IN HIGH-DENSITY PLASMA;
高密度等离子体刻蚀轮廓的数值研究
4.
Investigation of Etching SiCOH Films by Dual-Frequency Capacitively Coupled Plasma
SiCOH薄膜的双频等离子体刻蚀研究
5.
Simulations of Plasma Etching Based on Diffusion Limited Erosion Model
基于扩散限制刻蚀模型的等离子体刻蚀模拟研究
6.
Investigation of Inductively Coupled Fluorocarbon Plasma and Etching of SiO_2;
碳氟感应耦合等离子体及其SiO_2介质刻蚀研究
7.
The Study of the Etching Process with RF Cold Plasma at Atmospheric-pressure;
常压射频冷等离子体在刻蚀工艺中的应用研究
8.
Inductive Couple Plasmas Etching Processing of InSb Wafer
电感耦合等离子体刻蚀InSb芯片工艺的研究
9.
Research on array carbon nanotubes film without substrate by centrifugal infiltration and plasma etching
离心渗透等离子刻蚀法制备无基底阵列式碳纳米管复合膜
10.
Acceptable Error of Etching Depth in Ion Beam Etching Microlens
离子束蚀刻微透镜中蚀刻深度允许误差的研究
11.
In the plasma-etching mode the passivation layer that is formed on the surface is likely to be thicker than in the case of RIE.
在等离子刻蚀模式下，表面形成了比使用RIE情况下更厚的钝化层。
12.
In situ Monitoring Etch Process and Endpoint for LSI by the Plasma Emission Spectroscopy
大规模集成电路刻蚀过程和终点的在线监测──等离子发射光谱法
13.
Modeling and Simulation for Inductively Coupled Plasma Etching of Silicon in MEMS Fabrications;
MEMS加工中电感耦合等离子体（ICP）刻蚀硅片的模型与模拟
14.
Study of Inductively Coupled Plasma Etch of InP and Fabrication of 14xxnm Pump Laser Diodes;
感应耦合等离子体刻蚀InP研究与14xxnm泵浦激光器制作
15.
Inductively coupled plasma reactive ion etching of InSb photovoltaic detector arrays
InSb阵列探测芯片的感应耦合等离子反应刻蚀研究
16.
planar plasma reactor
平面式等离子体腐蚀器
17.
radical plasma etching
自由基等离子体腐蚀
18.
Generic specification of ion beam etching system
GB/T15861-1995离子束蚀刻机通用技术条件