1.
Preparation technique and performances characterization of diamond-like carbon films by RFGDPECVD method
射频辉光放电等离子体辅助化学气相沉积法制备类金刚石碳膜工艺与性能表征
2.
plasma activated chemical vapour deposition
等离子体化学气相沉积
3.
The Study of the Deposition of SiO_2 Films with RF Cold Plasma at Atmospheric-pressure;
常压射频低温等离子体增强化学气相沉积二氧化硅薄膜的研究
4.
Atmospheric-pressure Plasma Chemical Vapor Deposition for Polycrystalline Silicon Preparation from SiCl_4 and OES Diagnosis
由SiCl_4制备多晶硅的大气压等离子体化学气相沉积及发射光谱诊断
5.
Design and Investigation of Capacitive Coupling Radio Frequency Glow Discharge Source;
电容耦合射频辉光放电等离子体激发源研制
6.
The Measurement in SiCl_4/H_2 rf Glow Discharge Using Langmuir Probe;
射频辉光放电SiCl_4/H_2等离子体的探针诊断
7.
Probe Study of Space Characteristics of Plasma in Radio Frequency Glow Discharge;
射频辉光放电等离子体空间特性的探针研究
8.
Mass Spectroscopic Diagnosis of Plasma Space Properties in Radio Frequency Glow Discharge;
射频辉光放电等离子体空间特性的质谱诊断
9.
Study of PET Fiber Surface Modification by Radio Frequency Atmospheric Pressure Dielectric Barrier Glow Discharge;
射频常压介质阻挡辉光放电等离子体表面改性PET纤维的研究
10.
Atmospheric Pressure Glow Discharge Plasma in Intermediate Frequency and Its Application to Surface Modification of Textile Fibers
大气压中频辉光放电等离子体特性研究及其改性纺织纤维
11.
TEM Study on Diamond Films Deposited by MPCVD;
微波等离子体化学气相沉积金刚石薄膜的电子显微学分析
12.
Analysis of Residual Stress Distribution in DC Arc Plasma Jet CVD High Quality Diamond Films by Raman Spectroscopy
直流电弧等离子体喷射化学气相沉积高质量金刚石膜残余应力分布的拉曼谱分析(英文)
13.
The Preparation of Nanocrystalline Diamond Films by Electron Assisted Chemical Vapor Deposition (EACVD) and the Researches on the Photo-electric Properties;
电子辅助化学气相沉积法（EACVD）制备纳米金刚石薄膜及其光电性能的研究
14.
Deposition of Al_2O_3 Thin Films by Electrostatic Spray Assisted Vapor Deposition Method
静电辅助气溶胶化学气相沉积法制备Al_2O_3薄膜
15.
Deposition of Y_2O_3 thin films by electrostatic spray assisted vapor deposition method
静电辅助的气溶胶化学气相沉积法制备Y_2O_3薄膜
16.
Diamond thin films grown up by microwave plasma CVD
微波等离子体化学气相沉积金刚石簿膜
17.
WORKING PRINCIPLE OF MICROWAVE PLASMA CVD SET UP
微波等离子体化学气相沉积装置的工作原理
18.
Study on Device of Magneto-active Plasma Enhanced Chemical Vapor Deposition;
磁激活等离子体增强化学气相沉积设备的研制