1.
Gas sensing characteristics of SnO_(2-x) films deposited by RF reaction sputtering
射频反应溅射法制备SnO_(2-x)纳米薄膜的气敏特性研究
2.
Study on HfO_2 Thin Film by RF Magnetron Reactive Sputtering;
射频磁控反应溅射法制备HfO_2薄膜的研究
3.
Study on Y_2O_3 Thin Film by RF Magnetron Reactive Sputtering;
射频磁控反应溅射法制备Y_2O_3薄膜的研究
4.
The Study on the Microstructure and Properties of Al_2O_3 Thin Films Prepared by Radio Frequency Reactive Magnetron Sputtering;
射频反应磁控溅射法制备Al_2O_3薄膜结构与性能的研究
5.
The Study of Reactive Frequency Sputtering Prepared Electrochromic NiO_x Films;
反应性射频溅射制备电致变色NiO_x薄膜的研究
6.
Preparation and Field Emission Properties of Copper Nitride Films by Reactive Radio-frequency Magnetron Sputtering
射频反应磁控溅射制备氮化铜纳米薄膜及其场发射性能研究
7.
The Research on TiN Films Deposited by Magnetron Sputtering;
反应磁控溅射法制备TiN薄膜的研究
8.
Deposition of p Type ZnMgO Thin Films by DC Reactive Magnetron Sputtering;
直流反应磁控溅射法制备p型ZnMgO薄膜
9.
Preparation of Nanomaterials by Hydrothermal and Reactive Radio-frequency Magnetron Sputtering;
水热法及反应磁控溅射制备纳米材料
10.
Study on Band-gap Engineering of ZnO Films Made by Reactive Radio-Frequency Magnetron Sputtering;
射频反应磁控溅射ZnO薄膜能带工程相关问题研究
11.
Preparation and Characterization of Copper Nitride Films by Reactive Radio-frequency Magnetron Sputtering;
射频反应磁控溅射制备氮化铜（Cu_3N）薄膜及其性能研究
12.
Research on the Microstructure and Electric Breakdown Strength of Silicon Oxide Thin Film Deposited by RF Magnetron Reactive Sputtering
射频磁控反应溅射氧化硅薄膜微结构和电击穿场强研究
13.
Radio Frequency Magnetron Sputtering SnO_2 Doped MWCNTs Thin Film
射频反应磁控溅射SnO_2/MWCNTs薄膜材料的气敏性能研究
14.
Study on ZrW_2O_8 Films Prepared by Radio Frequency Magnetron Sputtering;
射频磁控溅射法合成ZrW_2O_8薄膜的研究
15.
Preparation of BN Films on Steels by Radio Frequency Magnetron Sputtering Method;
钢基表面射频磁控溅射法制备BN薄膜
16.
Na-doped p-type ZnO Thin Films Prepared by DC Reactive Magnetron Sputtering;
直流反应磁控溅射法制备Na掺杂p型ZnO薄膜
17.
Preparation of p-Type ZnMgO Thin Films Using Ga-N Codoping Method by Reactive Magnetron Sputtering;
直流反应磁控溅射法制备Ga-N共掺p型ZnMgO薄膜
18.
Preparation and Phase Transition Properties of VO_2 Thin Films by Reactive Magnetron Sputtering;
反应磁控溅射法制备VO_2薄膜及其相变特性研究