1.
Two-spectrum Method for Measuring the Thickness of Photoresist in Lithography Techniques
双光谱法实现光刻工艺中的胶厚检测
2.
Systematic Control Exploitation for Critical Dimension and Overlay in Photolithography Technology
光刻工艺中对线宽和套刻系统性控制的开发
3.
Lithography Study of UV-LIGA Technology;
UV-LIGA技术光刻工艺的研究
4.
The Optimization of the Photolithography Process for 0.35um BiCMOS Product
0.35微米BiCMOS光刻工艺参数的优化
5.
The Study of Add Anti Reflective Coating on PHOTO Resist Bottom in Lithography
对光刻工艺中在光阻底部增加抗反射涂层（BARC）的研究
6.
Optimization of Photolithography Process on the Fine Structure of Surface-conduction Electron-emitter Display
表面传导电子发射显示器微细结构光刻工艺的优化
7.
Research of SU-8 Resist Lithography Using Ultraviolet Laser;
紫外激光曝光光刻SU-8胶的工艺研究
8.
Optical properties and process of the diluted SU8 resist
改性SU8光刻胶的光学特性及其工艺
9.
PROCESS PARAMETERS DETERMINATION OF ETCHING LITHOGRAPHY SERVO DISK BY HF SPUTTERING
利用高频溅射刻蚀光刻伺服盘工艺参数的确定
10.
galvanoplastic screen process by laser engraving
激光雕刻[直接]电铸花网工艺
11.
Responsible for Implant /Diffusion/ Etch/ Photo new process development, process in-line control and development.
负责注入/扩散/刻蚀/光刻新工艺的开发及在线控制。
12.
Research of Active Carbon Adsorption to Purify Laser Sculpting Waste Gas;
活性炭吸附法治理激光工艺雕刻废气的研究
13.
Experimental Study on Excimer Laser Electrochemical Etching Process of Silicon;
准分子激光电化学刻蚀硅工艺实验研究
14.
Challenges on Oxide Etch with 193nm Photoresist;
193nm光阻对于绝缘体材料刻蚀工艺的挑战
15.
Study on the Improvement of Ashing Rate of Photoresist Ashing Process with CF4 Gas;
含氟气体的去光刻胶工艺灰化率提高的研究
16.
STUDY ON LASER GROOVING AND CHEMICAL ETCHING PROCESS FOR EWT BACK CONTACT SOLAR CELL
EWT背结电池中的激光刻槽及腐蚀工艺的研究
17.
A new method fir producing holographic gratings for high temperature is developed in this paper.
本文提出了应用双镀层光刻法制作高温全息光栅的新工艺。
18.
glass ,engraved or etched by any process
玻璃,经任何工艺雕刻或蚀刻