1.
Interaction of Ultrashort Intense Laser Pulses with Foil Targets and Temporally Resolved Study of Laser Plasma Channel;
超短超强激光与薄膜靶的相互作用和等离子体通道的时间分辨研究
2.
The Magnetic-field Analyses of Rectangular Planar Target and the Simulation of Film Thickness;
矩形平面靶磁场分析及薄膜厚度模拟
3.
PREPARATION OF AlSb POLYCRYSTALLENE THIN FILMS BY MAGNETRON SPUTTERING
用几何靶溅射方法制备AISb多晶薄膜
4.
Influence of Substrate-to-target Distance on the Properties of nc-Si Film Deposited by PLA;
靶衬间距对激光烧蚀制备纳米Si薄膜特性影响
5.
Preparation and Properties of Smco/cr Films by RF magnetron Sputtering More Target Together;
多靶射频磁控共溅射SmCo/Cr薄膜的制备和磁性能
6.
Research on Manufacture of AZO Transparent Conductive Oxide Targets and Its Films
AZO透明导电氧化物靶材及其薄膜制备的研究
7.
Development of fabrication technology of the CuInGaSe_2 thin film and its sputtering target
CuInGaSe_2太阳能薄膜及其靶材制备技术发展与前景
8.
ZrW_2O_8/ZrO_2 Film Growth and Its Composite Target Fabrication
脉冲激光沉积ZrW_2O_8/ZrO_2复合薄膜及其靶材制备
9.
Production process and application of in-line sputter for CIGS thin film solar cells
CIGS薄膜太阳能电池之单靶溅镀制程及应用
10.
Precision Rolling Technique of Molybdenum Foil for Equation of State
状态方程靶用钼薄膜精密轧制工艺研究
11.
Thermal Oxidation Annealing on Nanovanadium Oxide Thin Film Deposited by Direct Current Facing Targets Magnetron Sputtering
对向靶磁控溅射纳米氧化钒薄膜的热氧化处理
12.
Effect of Target Power and Bias on the Composition and Microstructure of BCN Films
靶功率和基体偏压对BCN薄膜成分及结构的影响
13.
Properties of Aluminum Nitride Thin Films Grown by Radio Frequency Magnetron Sputtering Using AlN Target
AlN靶材射频磁控溅射制备AlN薄膜及性质研究
14.
Magnetic and Structural Properties of NiZn Targets and Thin Film
NiZn铁氧体靶材及薄膜的磁性能和微观结构
15.
Influence of Negative Substrate Bias on Structure and Strain Prosperities of ZnO Films Prepared by PFCVAD
PFCVAD系统靶负压对硅基ZnO薄膜结构及应变的影响
16.
The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。
17.
Preparation of Sputtering Targets and Thin Film Structure Characterization of La and Ca-Doped PbTiO_3;
La和Ca掺杂PbTiO_3磁控溅射靶材制备及薄膜结构表征
18.
Study on Preparation of Vanadium Oxide Thin Films on Different Substrates Using Facing Targets DC Reactive Sputtering Technique;
利用对靶磁控溅射在不同衬底上制备氧化钒薄膜的研究