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1)  rectangle double-plane magnetron sputtering cathode
矩形双平面磁控溅射阴极
2)  planar magneton sputting
平面磁控溅射
3)  cathode spatter
阴极溅射
4)  cathode sputtering
阴极溅射
1.
A new net-shape cathode sputtering target which has a simple structure and a high sputtering rate was put forward.
设计了一种网状阴极溅射靶,它是由多个空心阴极并列交叉组合而成。
2.
A new net\|shape cathode sputtering target which has a simple structure and a high sputtering was put forward.
研究设计了一种网状阴极溅射靶 ,它是由多个空心阴极并列交叉组合而成。
3.
The cathode sputtering of nickel base alloy Inconel 625 was studied in double glow discharge.
研究了双层辉光放电条件下镍基合金Inconel 6 2 5的阴极溅射行为。
5)  plasma type cathodlic are source-magnetron sputtering
等离子体型阴极弧源-磁控溅射镀
6)  unbalanced magnetron sputtering
非平衡磁控溅射
1.
Characteristics of titanium-doped diamond-like carbon films deposited by unbalanced magnetron sputtering;
非平衡磁控溅射Ti掺杂类金刚石薄膜的基本特性
2.
The research on half-analytical method in calculating the magnetic field of unbalanced magnetron sputtering;
非平衡磁控溅射系统磁场的半解析法
3.
Effect of Al content on properties of Ti_(1-x)Al_xN hard film prepared by unbalanced magnetron sputtering;
Al含量对非平衡磁控溅射制备Ti_(1-x)Al_xN膜性能的影响
补充资料:阴极溅射室
分子式:
CAS号:

性质:一种测定固体试样的特殊原子化器。将试样车成空心棒状体,作为阴极密封于两端为光窗的金属圆筒中,充入惰性气体。阴、阳极之间加电压600V、电流60mA放电,使试样原子化。其放电原理与空心阴极灯相同。

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