1) using tungsten as mask
钨丝掩模
1.
By optimizing the technology parameters,850nm vertical cavity surface emitting laser is fabricated by large i nclined angle implantation using tungsten as mask,which is continuous operating at room temperature.
采用钨丝掩模技术 ,通过调整制作过程中的工艺参数 ,研制出批量器件阈值在 2 m A以内 ,最低阈值为1。
2) bombardment using tungsten wires as the mask
钨丝掩膜质子轰击
3) Tungsten coil
钨丝
1.
Tungsten coil devices have gained widespread applications in analytical atomic spectrometry since its introduction into atomic absorption spectrometry by Williams and Piepmeier in 1970s.
自70年代Williams和Piepmeier首次将钨丝应用到原子吸收光谱分析中以来,钨丝在原子光谱分析中获得了广泛的应用。
4) tungsten wire
钨丝
1.
The paper reviews briefly the development process of chinese tungsten materials and tungsten wire industry, it also introduces and analyzes the present situation, output, sort of products, process equipments, trade and scientific progresses of tungsten industry recent years .
简要回顾了中国钨材、钨丝加工业的发展历程,介绍和分析了近年钨加工行业的现状、产量、产品种类、工艺装备、外贸情况和科技进步。
2.
China has become the biggest production and consumption country in electric lighting industry in the world now,so the production capacity and consumption of tungsten wire is on a vast scale.
作为主要配套材料的钨丝 ,无论生产规模 ,还是消费能力也都成为了全球最大。
3.
The tensile strength of tungsten wire is enhanced with the increasing of deformation force.
钨丝的抗拉强度是随变形程度增大而增高 ,合理地控制退火工序前后的抗拉强度下降比例是生产高质量钨丝的关键。
5) tungsten filament
钨丝
1.
The switch transient processis is an important nonlinear resistance phenomenonof wolfram lamp, the resistance of which will rapidly be increased with the tempreture oftungsten filament.
白炽灯钨丝的电阻随温度迅速变化引起的开关瞬态过程是一个很重要的,非线性电阻现象。
2.
With the development of the productivity of tungsten filament, the mode of giving material by hand adopted by Tungsten pole production through swaging can’t meet the demand of the society more and more, for its bad working environment and unstable product quality.
随着钨丝生产行业的发展,旋锻法生产钨杆所采用的手工送料方式,由于工人劳动条件恶劣以及质量不稳定,越来越不能满足社会的需求。
6) screened solder mask
丝网印制钎焊掩模
补充资料：光学掩模版
分子式：
CAS号：
性质： 在薄膜、塑料或玻璃基体材料上制作各种功能图形并精确定位，以便用于光致抗蚀剂涂层选择性曝光的一种结构。
CAS号：
性质： 在薄膜、塑料或玻璃基体材料上制作各种功能图形并精确定位，以便用于光致抗蚀剂涂层选择性曝光的一种结构。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条