1) solution deposition
溶液沉积
1.
Zinc oxide nanopillars are synthesized by chemical solution deposition on a pre-coated substrate at a low temperature.
在预处理基底上,采用化学溶液沉积法在低温下制备氧化锌纳米柱薄膜。
2.
LiMn_2O_4 thin films were prepared by solution deposition through spin-coating technique.
通过旋转镀膜技术的溶液沉积法制备LiMn2O4薄膜,详细讨论了影响LiMn2O4薄膜形貌的各种因素。
3.
5O4/C composite was prepared by the solution deposition-vacuum pyrolysis method using LiNi0.
以蔗糖为碳源,采用溶液沉积-真空热解法制备了LiNi_(0。
2) Evaporation precipitation into aqueous solution
溶液蒸发沉积
3) chemical solution deposition
化学溶液沉积
1.
ZnO nanorods were grown on ITO conducting glass by the chemical solution deposition method (CBD) at a low temperature(90 ℃).
在低温条件下,利用化学溶液沉积法(CBD)成功在ITO导电玻璃衬底上生长出近一维ZnO纳米棒。
2.
On the one hand, in order to study the effects of film thickness on microstructures and electrical properties of BNT thin films, BNT films with different thicknesses were fabricated by chemical solution deposition (CSD).
一方面,用化学溶液沉积(CSD)法制备了不同薄膜厚度的BNT铁电薄膜,研究了薄膜厚度对BNT薄膜微观结构和电学性能的影响;另一方面,用静电纺丝法制备了BNT纳米纤维,并研究了BNT纳米纤维的微观结构和电学性能;同时,利用朗道理论对BNT纳米纤维的居里温度和电学性能进行了研究。
3.
YBCO superconducting film is fabricated on the single crystal LaAlO_3 substrates using non-fluorine chemical solution deposition.
本学位论文在LaAlO_3单晶基底上采用无氟化学溶液沉积法制备了YBCO超导薄膜。
4) aqueous solution electrodeposition
水溶液中电沉积
5) CSD
化学溶液沉积法
1.
75Ti3O12(BLT) thin films have been prepared by chemical solution deposition(CSD).
采用化学溶液沉积法在p-Si(100)衬底上制备了LaNiO3(LNO)下电极和Bi3。
2.
The Bi_2Ti_2O_7 thin film with strong (111) orientation was successfully prepared by chemical solution deposition (CSD) technique on n－ Si (100) using bismuth nitrate and titanium butoxide as starting materials.
采用化学溶液沉积法，以硝酸铋和钛酸四丁酯为原料成功地制备了 Bi_2Ti_2O_7介质膜。
3.
75)Ti_3O_(12) ((M=Nd,Al,In)) thin films have been prepared on LaNiO3 (LNO)/Si and quartz by chemical solution deposition (CSD), respectively.
采用化学溶液沉积法分别在LaNiO3(LNO)/Si和石英衬底上制备了Bi_(3。
6) Chemical solution deposition
化学溶液沉积法
1.
Preparation of YBa_2Cu_3O_7 thin films by chemical solution deposition;
化学溶液沉积法制备YBa_2Cu_3O_7超导薄膜
2.
Study on Preparation of LiMn_2O_4 Film Electrode by Chemical Solution Deposition Method;
化学溶液沉积法制备LiMn_2O_4薄膜电极的研究
3.
LaNiO3(LNO) thin films were prepared on(100)Si,SiO2/Si,(100)Al2O3,(100)MgO,(100)SrTiO3(STO),(100)ZrO2 substrates by chemical solution deposition.
采用化学溶液沉积法在(100)Si,SiO2/Si,(100)Al2O3,(100)MgO,(100)SrTiO3(STO),(100)ZrO2等衬底上制备了LaNiO3(LNO)薄膜,研究了热处理温度对薄膜结构和电性能的影响。
补充资料：电解沉积(见水溶液电解)
电解沉积(见水溶液电解)
electrowinning
d lanJ一e ehenji电解沉积(eleetrowinning)见水溶液电解。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条