1) dual-ion sputtering deposition
双离子束溅射淀积
2) ion sputtering deposition
离子束溅射淀积
3) Dual ion beam sputtering deposition
双离子束溅射沉积
1.
Cr-doped SiC films were fabricated on Si and KBr substrates by using dual ion beam sputtering deposition with Cr-metal pasted on a high-purity SiC sintered target.
利用高纯SiC烧结靶上粘贴金属Cr片的复合靶用双离子束溅射沉积方法,在Si和KBr单晶衬底上制备了掺杂SiC薄膜。
4) ion beam sputtering deposition
离子束溅射沉积
1.
Diamond-like carbon films(DLC films) were prepared by ion beam sputtering deposition and the effects of the bias on the properties of the films were studied.
采用离子束溅射沉积镀膜法制备了DLC薄膜,研究了偏压对薄膜性能的影响。
5) dual-ion beams sputtering
双离子束溅射
1.
Preparation narrow-band pass filter by dual-ion beams sputtering deposition;
双离子束溅射技术制备带通滤光片
6) Dual ion bean co sputtering
双离子束共溅射
补充资料：双低能离子束薄膜淀积设备
双低能离子束薄膜淀积设备
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说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条