1) ZrO_2 thin film
ZrO2薄膜
1.
Influence on the microstructure of ZrO_2 thin films deposited at different O_2 partial pressure and substrate temperature was analysed by X-ray diffraction (XRD) technique, the surface roughness and laser damage threshold also were measured.
采用X射线衍射(XRD)技术分析了不同充氧条件和沉积温度对ZrO2薄膜组成结构的影响,并对不同工艺下制备的薄膜的表面粗糙度和激光损伤阈值进行了测量。
2) ZrO2 film
ZrO2薄膜
1.
An anionic surfactant, 4-dodecylbenzenesulfonic acid (DBS-H), has been used to prepare ZrO2 films as the template at the air-water interface.
采用模板——十二烷基苯磺酸(DBS-H)在空气-水界面组装ZrO2薄膜,研究了DBS-H在ZrO2自组装薄膜中的水溶性、化学稳定性、热稳定性和光化学稳定性。
2.
Three anionic surfactants, sodium dodecyl sulfate (SDS), 4-dodecylbenzenesulfonic acid (DBS-H) and sodium 4-dodecylbenzenesulfonate (DBS-Na) have been readily employed to prepare ZrO2 films at the air-water interface.
采用三种阴离子表面活性剂:十二烷基磺酸钠(SDS),十二烷基苯磺酸钠(DBS-Na),十二烷基苯磺酸(DBS-H)作模板,在空气-水界面上组装ZrO2薄膜。
3.
Electrical properties testing shows the equivalent oxide thickness of 10 nm-thick ZrO2 film is 3.
采用脉冲激光沉积方法在Si衬底上沉积了ZrO2栅介质薄膜,X射线衍射分析表明该薄膜经过450℃退火后低介电界面层得到抑制,仍然保持非晶状态;电学测试显示10 nm厚ZrO2薄膜的等效厚度为3。
3) ZrO2 films
ZrO2薄膜
1.
By combining Swanepoel s theory and the Wemple-DiDomenico dispersion model,a simple method was established to determine the optical constants of the sol-gel derived ZrO2 films directly from the corresponding transmission spectra.
基于溶胶凝胶ZrO2薄膜的紫外/可见/近红外透射实验光谱,采用Swanepoel方法结合Wemple-Di Domenico色散模型,方便地导出了ZrO2薄膜在200—1200nm波长范围内的光学常数,包括折射率、色散常数、膜层厚度、吸收系数及能量带隙。
4) ZrO_2 films
ZrO2薄膜
1.
ZrO_2 films were prepared by electron beam evaporation method at different oxygen partial pressures.
在不同的氧分压下用电子束热蒸发的方法制备了ZrO2薄膜。
5) ZrO2/SiO2 film
ZrO2/SiO2薄膜
6) ZrO_2-TiO_2 films
ZrO2-TiO2薄膜
补充资料：Baddeleyite(ZrO2)
CAS：12036-23-6
分子式：ZrO2
分子质量：123.22
中文名称：斜锆石
英文名称：baddeleyite；Baddeleyite(ZrO2)；caldasite
分子式：ZrO2
分子质量：123.22
中文名称：斜锆石
英文名称：baddeleyite；Baddeleyite(ZrO2)；caldasite
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条