1) alloy sputtering
合金溅射
1.
In 1982, phenomena of bombardmentinduced Gibssian segregation(BIGS) during alloy sputtering at low temperature were found.
低温时,合金溅射的轰击诱发吉布斯偏析(bombardment-inducedGibbsiansegregation)现象,是在1982年首次发现的。
2) Metal sputtering
金属态溅射
3) metal atom sputtering
金属原子溅射
4) Nonmetal sputtering
非金属态溅射
5) sputtering
[英]['spʌtə] [美]['spʌtɚ]
溅射
1.
XPS study of Ni_(49.54)Mn_(29.59)Ga_(20.87) magnetically driven shape memory alloy thin film fabricated by D.C magnetron sputtering technique;
直流磁控溅射Ni_(49.54)Mn_(29.59)Ga_(20.87)磁驱动记忆合金薄膜的XPS研究
2.
Growth and characterization of aluminum nitride films by penning-type discharge plasma sputtering process;
潘宁放电溅射沉积纳米级AlN薄膜的性质
3.
Growth of TiN Film by Modified Ion Beam Enhanced Magnetron Sputtering;
气离溅射离子镀制氮化钛
6) Sputtered
[英]['spʌtə] [美]['spʌtɚ]
溅射
1.
In order to improve appearance and hydrophobicity of waterproof and moisture permeable coatings, the yellowish of sputtered polymeric fluorocarbon films was investigated.
为改善射频溅射法制备的防水透湿涂层的外观和拒水性 ,对涤纶织物基底上的溅射氟碳高分子膜的泛黄问题进行了研究。
2.
By means of the Monte-Carlo simulation based on the binding collision approximation,this paper investigates the sputtering of Silver and Cadmium element targets bombarded by 27 keV Ar+ ions and studies the spatial distribution of sputtered atoms by collision cascade.
用蒙特卡罗方法模拟能量为２７ｋｅＶＡｒ＋轰击Ａｇ和Ｃｄ单元素靶的力学运动，以研究级联碰撞产生的溅射原子的空间分布情况，对计算结果进行适当的数学处理，以得出微分溅射产额角分布。
3.
The XRD patterns of SnO2 thin film sputtered with different methods are compare 1 for their difference in the field of structure.
本文采用三种不同的溅射方法制备具有纳米尺度的SnO2薄膜,针对溅射方式的不同,结合薄膜结构上的差异,对三种溅射方式制备的SnO2薄膜进行了XRD分析比较。
补充资料：东北轻合金加工厂生产的铝合金挤压管材和空心材
东北轻合金加工厂生产的铝合金挤压管材和空心材
睽铝合;;:;;;、:;产的
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条