1) magnetic multi-sputtering
薄膜磁控共溅
3) co-sputtered thin films
共溅射薄膜
4) magnetron co-sputtering
磁控共溅射
1.
Silicon carbide (SiC) nanocrystals embedded in silicon oxide (SiO2) matrix on Si(111) substrates were prepared by radio frequency (RF) magnetron co-sputtering using a SiO2/SiC composite target and adopting subsequent high temperature annealing.
采用二氧化硅/碳化硅复合靶,用射频磁控共溅射技术和后高温退火的方法在Si(111)衬底上制备了碳化硅纳米颗粒/二氧化硅基质(nc-SiC/SiO2)镶嵌结构薄膜材料,用X射线衍射(XRD),傅里叶红外吸收(FTIR),扫描电子显微镜(SEM)和光致发光(PL)实验分析了薄膜的微结构以及光致发光特性。
2.
SiC nanocrystals embedded in SiO2 matrix on Si(111)substrates were prepared by RF magnetron co-sputtering with a SiO2/SiC composite target and subsequent high temperature annealing.
采用二氧化硅/碳化硅复合靶,用射频磁控共溅射技术和后高温退火的方法在Si(111)衬底上制备了碳化硅纳米颗粒/二氧化硅基质(nc-SiC/SiO2)镶嵌结构薄膜材料。
3.
31) thin films were prepared on c-cut sapphire substrates by magnetron co-sputtering.
采用磁控共溅射法在Al2O3(0001)基片上沉积了Zn1-xCoxO(x=0。
5) MoS_2 based cosputtered films
MoS_2基共溅射薄膜
补充资料：溅溅
1.流水声。 2.水疾流貌。 3.泛指液体疾溅貌。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条